⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL943336 | 0.83 | — | — | |
| Hydrochloric Acid SCHEMBL5183498 | 0.80 | CYP1A2 (0.56) | — | |
| Bromide SCHEMBL11800221 | 0.80 | CYP1A2 (0.56) | — | |
| Ethylene SCHEMBL11417277 | 0.80 | CYP1A2 (0.56) | — | |
| SCHEMBL7922582 | 0.78 | — | — | |
| SCHEMBL445534 | 0.75 | — | — | |
| SCHEMBL15368030 | 0.75 | — | — | |
| SCHEMBL15367986 | 0.75 | — | — | |
| SCHEMBL16838620 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL22575457 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7063938-B2 | filling a monomer solution into interstices of colloidal crystals for photopolymerization inside them; masking; not only more simplified two-dimensional patterns but also complicated two- or three-dimensional patterns can be obtained | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2006-06-20 | — | — | US | disclosed |
| EP-1587850-B1 | CURING AGENTS FOR CATIONICALLY CURABLE COMPOSITIONS | 3M INNOVATIVE PROPERTIES CO (US) | 2006-05-31 | — | — | EP | disclosed |
| WO-2005068523-A1 | METHOD OF CURING USING AN ELECTROLUMINESCENT LIGHT | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2005-07-28 | — | — | WO | disclosed |
| US-20040146811-A1 | filling a monomer solution into interstices of colloidal crystals for photopolymerization inside them; masking; not only more simplified two-dimensional patterns but also complicated two- or three-dimensional patterns can be obtained | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2004-07-29 | — | — | US | disclosed |
| US-4689290-A | CARBOXYLATED ACRYLONITRILE-BUTADIENE COPOLYMER; MULTILAYER | UNIROYAL PLASTICS CO., INC. (US) | 1987-08-25 | — | — | US | disclosed |
| US-4686172-A | Photosensitive elastomeric composition for flexographic printing plates having improved softness | UNIROYAL PLASTICS CO., INC. (US) | 1987-08-11 | — | — | US | disclosed |