⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17791736 | 0.72 | CYP2C19 (0.31) | — | |
| SCHEMBL8948280 | 0.71 | — | — | |
| SCHEMBL7738739 | 0.70 | — | — | |
| SCHEMBL7739508 | 0.69 | — | — | |
| SCHEMBL17791675 | 0.69 | — | — | |
| SCHEMBL17791677 | 0.67 | CYP2C19 (0.31) | — | |
| SCHEMBL11233349 | 0.67 | CYP4F2 (0.31) | — | |
| SCHEMBL11238651 | 0.67 | CYP4F2 (0.31) | — | |
| SCHEMBL2361514 | 0.67 | MEN1 (0.31) | — | |
| SCHEMBL11127725 | 0.67 | CYP4F2 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11561471-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-24 | — | — | US | disclosed |
| CN-106918990-B | Photoresist composition | 住友化学株式会社 | 2022-01-25 | — | — | CN | disclosed |
| CN-105377828-B | The manufacture method of cyclic carbonate | 国立研究开发法人产业技术综合研究所 | 2018-02-09 | — | — | CN | disclosed |
| US-9856229-B2 | Method for producing cyclic carbonate | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2018-01-02 | — | — | US | disclosed |
| CN-107429081-A | Cured film is formed with composition, orientation material and phase difference material | 日产化学工业株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107406720-A | Composition for forming cured film, alignment material, and phase difference material | 日产化学工业株式会社 | 2017-11-28 | — | — | CN | disclosed |
| CN-107253935-A | Trap compound, the preparation method of polymerizable compound and the method for using the manufacture raw material of hydrazine compound as polymerizable compound | 日本瑞翁株式会社 | 2017-10-17 | — | — | CN | disclosed |
| US-20170168393-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-15 | — | — | US | disclosed |
| CN-104603165-B | Polymerizable compound, polymerizable composition, polymer, optically anisotropic body, and method for producing polymerizable compound | 日本瑞翁株式会社 | 2017-04-26 | — | — | CN | disclosed |
| CN-106479329-A | Coating compositions for use with overcoated photoresists | 罗门哈斯电子材料有限责任公司 | 2017-03-08 | — | — | CN | disclosed |
| US-20160145234-A1 | METHOD FOR PRODUCING CYCLIC CARBONATE | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2016-05-26 | — | — | US | disclosed |
| EP-3023418-A1 | METHOD FOR MANUFACTURING CYCLIC CARBONATE | National Institute of Advanced Industrial Science and Technology (JP) | 2016-05-25 | — | — | EP | disclosed |
| CN-105377828-A | Method for manufacturing cyclic carbonate | NAT INST ADVANCED IND SCIENCE & TECH | 2016-03-02 | — | — | CN | disclosed |
| CN-104603165-A | Polymerizable compound, polymerizable composition, polymer, optically anisotropic body, and method for producing polymerizable compound | ZEON CORP | 2015-05-06 | — | — | CN | disclosed |
| US-20060135663-A1 | Fluorinated copolymer process for its production and resist composition containing it | ASAHI GLASS COMPANY, LIMITED (JP) | 2006-06-22 | — | — | US | disclosed |
| EP-1657264-A1 | FLUOROCOPOLYMER, PROCESS FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME | ASAHI GLASS COMPANY LTD. (JP) | 2006-05-17 | — | — | EP | disclosed |
| US-4568700-A | NONCARCINOGEN | YEDA RESEARCH AND DEVELOPMENT CO. LTD. (IL) | 1986-02-04 | — | — | US | disclosed |