⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7922038 | 0.91 | TSHR (0.50) | — | |
| SCHEMBL28605607 | 0.88 | EPHX1 (0.50) | — | |
| SCHEMBL28666302 | 0.88 | EPHX1 (0.50) | — | |
| SCHEMBL28128960 | 0.88 | TSHR (0.48) | — | |
| SCHEMBL6744306 | 0.88 | EPHX1 (0.50) | — | |
| SCHEMBL28654503 | 0.88 | EPHX1 (0.50) | — | |
| SCHEMBL10699097 | 0.88 | EPHX1 (0.50) | — | |
| SCHEMBL28662778 | 0.88 | EPHX1 (0.50) | — | |
| SCHEMBL28928656 | 0.88 | EPHX1 (0.50) | — | |
| SCHEMBL6746283 | 0.88 | EPHX1 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 130 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| CN-119900018-A | Composition for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2025-04-29 | — | — | CN | claimed |
| EP-4013903-A1 | COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON-CONTAINING FILMS | Versum Materials US, LLC (US) | 2022-06-22 | — | — | EP | claimed |
| US-20210363639-A1 | COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC (US) | 2021-11-25 | — | — | US | claimed |
| EP-3844319-A1 | COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | Versum Materials US, LLC (US) | 2021-07-07 | — | — | EP | claimed |
| CN-112969816-A | Compositions for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-06-15 | — | — | CN | claimed |
| WO-2021050368-A1 | COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON-CONTAINING FILMS | VERSUM MATERIALS US, LLC (US) | 2021-03-18 | — | — | WO | claimed |
| WO-2020072768-A1 | COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC (US) | 2020-04-09 | — | — | WO | claimed |
| US-9460912-B2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-10-04 | — | — | US | claimed |
| US-3983114-A | Method of preparation of 6-aza uracile and its O-disilyl derivative | NOBEL HOECHST CHIMIE (FR) | 1976-09-28 | — | — | US | claimed |
| US-20260076110-A1 | HYBRID ATOMIC LAYER DEPOSITION | LAM RES CORP (US) | 2026-03-12 | — | — | US | disclosed |
| US-20250372367-A1 | DEPOSITION AND ETCH OF SILICON-CONTAINING LAYER | LAM RES CORP (US) | 2025-12-04 | — | — | US | disclosed |
| EP-4624625-A2 | FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SILICON-CONTAINING FILMS | Versum Materials US, LLC (US) | 2025-10-01 | — | — | EP | disclosed |
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | disclosed |
| EP-3630785-B1 | FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SILICON-CONTAINING FILMS | VERSUM MAT US LLC (US) | 2025-09-03 | — | — | EP | disclosed |
| WO-1991016301-A1 | PESTICIDES | THE WELLCOME FOUNDATION LIMITED (GB) | 1991-10-31 | — | — | WO | disclosed |
| US-4745212-A | ESTERIFICATION OR AMIDATION OF ISOCYANATOCARBOXYL CHLORIDE | BAYER AKTIENGESELLSCHAFT (DE) | 1988-05-17 | — | — | US | disclosed |
| EP-0263481-A2 | Process for the preparation of isocyanates | BAYER AG (DE) | 1988-04-13 | — | — | EP | disclosed |
| US-4412073-A | Isocyanurate preparation by catalytic, aminosilyl initiated cyclotrimerization of isocyanates | RHONE-POULENC SPECIALITES CHIMIQUES (FR) | 1983-10-25 | — | — | US | disclosed |
| US-3983114-A | Method of preparation of 6-aza uracile and its O-disilyl derivative | NOBEL HOECHST CHIMIE (FR) | 1976-09-28 | — | — | US | disclosed |