SCHEMBL5697597

SCHEMBL5697597

C=CC(C)OC([O])=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1352110 0.81 TSHR (0.34)
SCHEMBL14079329 0.79
SCHEMBL1352111 0.79
SCHEMBL4672993 0.79
SCHEMBL1420718 0.79
SCHEMBL851711 0.77
SCHEMBL20815909 0.77 TSHR (0.32)
SCHEMBL10917784 0.77 HCAR2 (0.48)
SCHEMBL2971254 0.77
SCHEMBL13592944 0.77 TSHR (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4371979-A1 FORMAMIDE DERIVATIVE AND AGRICULTURAL OR HORTICULTURAL PLANT DISEASE CONTROL AGENT Kumiai Chemical Industry Co., Ltd. (JP) 2024-05-22 EP disclosed
WO-2023286855-A1 FORMAMIDE DERIVATIVE AND AGRICULTURAL OR HORTICULTURAL PLANT DISEASE CONTROL AGENT クミアイ化学工業株式会社 2023-01-19 WO disclosed
EP-2540719-B1 CYCLIC AMINE COMPOUND AND ACARICIDE NIPPON SODA CO (JP) 2015-10-07 EP disclosed
US-8980912-B2 Cyclic amine compound and acaricide NIPPON SODA CO., LTD. (JP) 2015-03-17 US disclosed
EP-2540719-A1 CYCLIC AMINE COMPOUND AND MITICIDE Nippon Soda Co., Ltd. (JP) 2013-01-02 EP disclosed
US-20120309964-A1 CYCLIC AMINE COMPOUND AND ACARICIDE NIPPON SODA CO., LTD 2012-12-06 US disclosed
EP-1441256-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-05-31 EP disclosed
EP-0789278-B1 Radiation-sensitive resin composition JSR CORP (JP) 2005-05-04 EP disclosed
EP-1441256-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2004-07-28 EP disclosed
US-6727032-B1 USEFUL IN MICRO-PROCESSING USING VARIOUS RADIATIONS, E.G., FAR-ULTRAVIOLET RADIATION SUCH AS KRF EXCIMER LASER OR ARF EXCIMER LASER, X RAYS SUCH AS SYNCHROTRON RADIATION, CHARGED PARTICLE RADIATION SUCH AS ELECTRON BEAM, ETC. JSR CORPORATION (JP) 2004-04-27 US disclosed
US-6692887-B1 COPOLYMER OF SUCH AS MALEIC ANHYDRIDE AND NORBORNENE ACID CLEAVABLE DERIVATIVE; TRANSPARENCY; DRY ETCHING RESISTANCE; PHOTORESIST PATTERN WITH HIGH ADHESION, SENSITIVITY, RESOLUTION AND DEVELOPABILITY JSR CORPORATION (JP) 2004-02-17 US disclosed
EP-1157058-B1 METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS SUMITOMO BAKELITE CO (JP) 2003-06-25 EP disclosed
US-6420503-B1 POLYCARBONS/OTHER/ SUMITOMO BAKELITE CO. LTD. (JP) 2002-07-16 US disclosed
EP-1157058-A1 METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS The B.F. Goodrich Company (US) 2001-11-28 EP disclosed
US-6235849-B1 INCLUDE COPOLYMERS WITH ONE OR MORE COMONOMERS SUCH AS NORBORNENE, ETHYLENE, AN ACRYLATE OR SULFUR DIOXIDE OR CARBON MONOXIDE; ALSO RING-OPENING METATHESIS POLYMERIZATION; GROUP VIII METAL COMPOUND CATALYST THE B. F. GOODRICH COMPANY 2001-05-22 US disclosed
WO-2000046267-A1 METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS THE B.F. GOODRICH COMPANY (US) 2000-08-10 WO disclosed
WO-2000046268-A1 NORBORNENE SULFONAMIDE POLYMERS THE B.F. GOODRICH COMPANY (US) 2000-08-10 WO disclosed
EP-0789278-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-08-13 EP disclosed
WO-1993011669-A1 USE OF 3-PHENYLURACIL DERIVATIVES FOR THE DESICCATION AND ABSCISSION OF PLANT PARTS BASF AKTIENGESELLSCHAFT (DE) 1993-06-24 WO disclosed