SCHEMBL5697652

SCHEMBL5697652

C[C@H](CCC(=O)OC1CCCCO1)[C@H]1CC[C@H]2[C@@H]3[C@H](O)C[C@@H]4C[C@H](O)CC[C@]4(C)[C@H]3C[C@H](O)[C@]12C

nearest known ligand 0.73

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.73
KMT2A Q03164 2/20 0.73
MEN1 O00255 1/20 0.73
SLCO1B3 Q9NPD5 1/20 0.73
SLCO1B1 Q9Y6L6 1/20 0.73
USP2 O75604 1/20 0.73
GPBAR1 Q8TDU6 10/20 0.69
PDE3A Q14432 1/20 0.69
NR1H4 Q96RI1 1/20 0.69
ALDH1A1 P00352 1/20 0.67
TDP1 Q9NUW8 1/20 0.67
LMNA P02545 1/20 0.64
ABCB11 O95342 1/20 0.62
CYP8B1 Q9UNU6 1/20 0.61
CA1 P00915 1/20 0.60
CA2 P00918 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6354477 0.98 CYP3A4 (0.74) CYP3A4KMT2AMEN1SLCO1B3SLCO1B1
SCHEMBL5428623 0.88 GPBAR1 (0.83) CYP3A4KMT2AMEN1SLCO1B3SLCO1B1
SCHEMBL135706 0.88 MAPT (0.73) CYP3A4KMT2AMEN1SLCO1B3SLCO1B1
SCHEMBL5436354 0.88 GPBAR1 (0.81) CYP3A4KMT2AMEN1SLCO1B3SLCO1B1
Cholic Acid, Methyl Ester SCHEMBL23639774 0.85 CYP3A4 (1.00) CYP3A4KMT2AMEN1SLCO1B3SLCO1B1
Cholic Acid, Methyl Ester SCHEMBL20906040 0.85 CYP3A4 (1.00) CYP3A4KMT2AMEN1SLCO1B3SLCO1B1
Cholic Acid, Methyl Ester SCHEMBL13562956 0.85 CYP3A4 (1.00) CYP3A4KMT2AMEN1SLCO1B3SLCO1B1
Cholic Acid, Methyl Ester SCHEMBL20905832 0.85 CYP3A4 (1.00) CYP3A4KMT2AMEN1SLCO1B3SLCO1B1
Cholic Acid, Methyl Ester SCHEMBL21283582 0.85 CYP3A4 (1.00) CYP3A4KMT2AMEN1SLCO1B3SLCO1B1
Cholic Acid, Methyl Ester SCHEMBL14402319 0.85 CYP3A4 (1.00) CYP3A4KMT2AMEN1SLCO1B3SLCO1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1441256-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-05-31 EP disclosed
US-6974658-B2 HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS KABUSHIKI KAISHA TOSHIBA (JP) 2005-12-13 US disclosed
EP-0789278-B1 Radiation-sensitive resin composition JSR CORP (JP) 2005-05-04 EP disclosed
EP-1441256-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2004-07-28 EP disclosed
US-6727032-B1 USEFUL IN MICRO-PROCESSING USING VARIOUS RADIATIONS, E.G., FAR-ULTRAVIOLET RADIATION SUCH AS KRF EXCIMER LASER OR ARF EXCIMER LASER, X RAYS SUCH AS SYNCHROTRON RADIATION, CHARGED PARTICLE RADIATION SUCH AS ELECTRON BEAM, ETC. JSR CORPORATION (JP) 2004-04-27 US disclosed
US-6692887-B1 COPOLYMER OF SUCH AS MALEIC ANHYDRIDE AND NORBORNENE ACID CLEAVABLE DERIVATIVE; TRANSPARENCY; DRY ETCHING RESISTANCE; PHOTORESIST PATTERN WITH HIGH ADHESION, SENSITIVITY, RESOLUTION AND DEVELOPABILITY JSR CORPORATION (JP) 2004-02-17 US disclosed
US-6180316-B1 SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS JSR CORPORATION (JP) 2001-01-30 US disclosed
EP-0930541-A1 Radiation sensitive resin composition JSR Corporation (JP) 1999-07-21 EP disclosed
EP-0789278-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-08-13 EP disclosed