⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13249524 | 1.00 | — | — | |
| SCHEMBL2113375 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL22771588 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL22771589 | 0.97 | — | — | |
| SCHEMBL15478935 | 0.86 | — | — | |
| SCHEMBL562701 | 0.83 | KDM1A (0.63) | — | |
| SCHEMBL562702 | 0.83 | KDM1A (0.63) | — | |
| SCHEMBL37332 | 0.83 | — | — | |
| SCHEMBL37331 | 0.83 | — | — | |
| SCHEMBL19237332 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | claimed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | claimed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | claimed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | claimed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | claimed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230305394-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305393-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| WO-2023091707-A1 | BICYCLIC INHIBITORS OF JAK AND METHODS OF USE | THERAVANCE BIOPHARMA R&D IP, LLC (US) | 2023-05-25 | — | — | WO | disclosed |
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | disclosed |
| US-5892125-A | REACTING 1,3-BUTADIENE WITH AN AMINE; ISOMERIZATION | BASF AKTIENGESELLSCHAFT (DE) | 1999-04-06 | — | — | US | disclosed |
| EP-0778819-B1 | PROCESS FOR PRODUCING N-BUTYRALDEHYDE AND/OR N-BUTANOL | BASF AG (DE) | 1999-01-13 | — | — | EP | disclosed |
| EP-0778819-A1 | PROCESS FOR PRODUCING N-BUTYRALDEHYDE AND/OR N-BUTANOL | BASF AKTIENGESELLSCHAFT (DE) | 1997-06-18 | — | — | EP | disclosed |
| WO-1996007630-A1 | PROCESS FOR PRODUCING N-BUTYRALDEHYDE AND/OR N-BUTANOL | BASF AKTIENGESELLSCHAFT (DE) | 1996-03-14 | — | — | WO | disclosed |
| US-4409224-A | Pyrimido[1,6-a]indole derivatives | AMERICAN HOME PRODUCTS CORP. (US) | 1983-10-11 | — | — | US | disclosed |
| US-4307234-A | Pyrimido[1,6-a]indole derivatives | AMERICAN HOME PRODUCTS CORP. (US) | 1981-12-22 | — | — | US | disclosed |
| WO-1980000537-A1 | PYRIMIDO(1,6-A)INDOLE DERIVATIVES | AMERICAN HOME PROD (US) | 1980-04-03 | — | — | WO | disclosed |
| EP-0008950-A2 | Pyrimido(1,6-a)indole derivatives and intermediates therefor, processes for their preparation, pharmaceutical compositions containing the derivatives and their use | AMERICAN HOME PRODUCTS CORPORATION (US) | 1980-03-19 | — | — | EP | disclosed |