SCHEMBL5699227

SCHEMBL5699227

CCCCCCC(C)=CCCC=C(C)CCCCCC

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SQLE Q14534 3/20 0.52
KMT2A Q03164 3/20 0.48
LSS P48449 1/20 0.47
CES2 O00748 3/20 0.44
CES1 P23141 3/20 0.44
TERT O14746 3/20 0.43
PTPN1 P18031 3/20 0.43
PPARG P37231 3/20 0.43
PPARD Q03181 3/20 0.43
PPARA Q07869 3/20 0.43
CYP1A2 P05177 2/20 0.43
MAPT P10636 2/20 0.43
CYP2C19 P33261 2/20 0.43
BLM P54132 2/20 0.43
HSD17B10 Q99714 2/20 0.43
FABP4 P15090 2/20 0.43
FAAH O00519 2/20 0.43
GMNN O75496 1/20 0.43
USP2 O75604 1/20 0.43
LMNA P02545 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25404141 1.00 SQLE (0.52) SQLEKMT2ALSSCES2CES1
SCHEMBL7973488 0.93 LSS (0.46) SQLEKMT2ALSSCES2CES1
SCHEMBL9545639 0.93 EP300 (0.48) SQLEKMT2ALSSTERTPTPN1
SCHEMBL2019221 0.93 EP300 (0.48) SQLEKMT2ALSSTERTPTPN1
SCHEMBL9545730 0.93 EP300 (0.48) SQLEKMT2ALSSTERTPTPN1
SCHEMBL9545718 0.93 EP300 (0.48) SQLEKMT2ALSSTERTPTPN1
SCHEMBL2012470 0.93 LSS (0.46) SQLEKMT2ALSSCES2CES1
SCHEMBL9545638 0.93 EP300 (0.48) SQLEKMT2ALSSTERTPTPN1
SCHEMBL9545687 0.93 EP300 (0.48) SQLEKMT2ALSSTERTPTPN1
SCHEMBL3321057 0.93 LSS (0.46) SQLEKMT2ALSSCES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1685178-A1 CURABLE POLYESTER HAVING AN OXETANYL GROUP AT END AND PROCESS FOR PREPARING THE SAME, RESIST COMPOSITION, JET PRINTING INK COMPOSITION, CURING METHODS AND USES THEREOF Showa Denko K.K. (JP) 2006-08-02 EP disclosed
WO-2005044893-A1 CURABLE POLYESTER HAVING AN OXETANYL GROUP AT END AND PROCESS FOR PREPARING THE SAME, RESIST COMPOSITION, JET PRINTING INK COMPOSITION, CURING METHODS AND USES THEREOF SHOWA DENKO K.K. (JP) 2005-05-19 WO disclosed