Acetic Acid

Acetic Acid

SCHEMBL570686

CC(=O)O.Cl.[Pd]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL18092198 1.00
Acetic Acid SCHEMBL1979942 1.00
Acetic Acid SCHEMBL570685 1.00 FFAR3 (0.78)
Acetic Acid SCHEMBL28384379 0.95
Acetic Acid SCHEMBL4226194 0.95
Acetic Acid SCHEMBL1230066 0.94 FFAR3 (0.88)
Acetic Acid SCHEMBL8328631 0.94
Acetic Acid SCHEMBL667744 0.94
Acetic Acid SCHEMBL11224118 0.94 FFAR3 (0.88)
Acetic Acid SCHEMBL8930581 0.94 FFAR3 (0.88)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109369502-A A kind of indomethacin derivatives and its preparation method and application 宜春学院 2019-02-22 CN claimed
CN-105753767-B The preparation method of the methyl indol of 3 cyano group, 5 methoxyl group 2 宜春学院 2018-02-27 CN claimed
CN-105753767-A Preparation method of 3-cyano-5-methoxy-2-methylindole 宜春学院 2016-07-13 CN claimed
US-20130133942-A1 PROCESS FOR THE FABRICATION OF HIGHLY ELECTRICALLY-CONDUCTIVE POLYMER FOAMS WITH CONTROLLED COMPRESSION SET SUITABLE FOR USE IN EMI SHIELDING APPLICATIONS LAIRD TECHNOLOGIES, INC. (US) 2013-05-30 US claimed
WO-2012018595-A2 PROCESS FOR THE FABRICATION OF HIGHLY ELECTRICALLY- CONDUCTIVE POLYMER FOAMS WITH CONTROLLED COMPRESSION SET SUITABLE FOR USE IN EMI SHIELDING APPLICATIONS LAIRD TECHNOLOGIES, INC. (US) 2012-02-09 WO claimed
CN-109369502-A A kind of indomethacin derivatives and its preparation method and application 宜春学院 2019-02-22 CN disclosed
CN-105753767-B The preparation method of the methyl indol of 3 cyano group, 5 methoxyl group 2 宜春学院 2018-02-27 CN disclosed
CN-105753767-B The preparation method of the methyl indol of 3 cyano group, 5 methoxyl group 2 宜春学院 2018-02-27 CN disclosed
CN-105753767-A Preparation method of 3-cyano-5-methoxy-2-methylindole 宜春学院 2016-07-13 CN disclosed
US-20130133942-A1 PROCESS FOR THE FABRICATION OF HIGHLY ELECTRICALLY-CONDUCTIVE POLYMER FOAMS WITH CONTROLLED COMPRESSION SET SUITABLE FOR USE IN EMI SHIELDING APPLICATIONS LAIRD TECHNOLOGIES, INC. (US) 2013-05-30 US disclosed
WO-2012018595-A2 PROCESS FOR THE FABRICATION OF HIGHLY ELECTRICALLY- CONDUCTIVE POLYMER FOAMS WITH CONTROLLED COMPRESSION SET SUITABLE FOR USE IN EMI SHIELDING APPLICATIONS LAIRD TECHNOLOGIES, INC. (US) 2012-02-09 WO disclosed
US-7268196-B2 Process for producing cycloolefin addition polymer JSR CORPORATION (JP) 2007-09-11 US disclosed
US-7241847-B2 Process for producing cycloolefin addition polymer JSR CORPORATION (JP) 2007-07-10 US disclosed
US-20070123667-A1 PROCESS FOR PRODUCING CYCLOOLEFIN ADDITION POLYMER JSR CORPORATION (JP) 2007-05-31 US disclosed
US-20060217505-A1 Process for producing cycloolefin addition polymer JRS CORPORATION (JP) 2006-09-28 US disclosed
EP-1657259-A1 PROCESS FOR PRODUCING CYCLOOLEFIN ADDITION POLYMER JSR Corporation (JP) 2006-05-17 EP disclosed