⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Vinyl Ether SCHEMBL14645581 | 1.00 | — | — | |
| Vinyl Ether SCHEMBL5160536 | 1.00 | — | — | |
| Vinyl Ether SCHEMBL481564 | 1.00 | — | — | |
| Vinyl Ether SCHEMBL28369081 | 0.95 | — | — | |
| Vinyl Ether SCHEMBL19363 | 0.94 | — | — | |
| Vinyl Ether SCHEMBL477946 | 0.94 | — | — | |
| Vinyl Ether SCHEMBL6434755 | 0.89 | — | — | |
| Vinyl Ether SCHEMBL866680 | 0.89 | — | — | |
| Vinyl Ether SCHEMBL719876 | 0.89 | — | — | |
| Vinyl Ether SCHEMBL4725471 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1077391-B1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2006-09-27 | — | — | EP | disclosed |
| US-6869744-B2 | Chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-22 | — | — | US | disclosed |
| US-6838224-B2 | Chemical amplification, positive resist compositions | SHI-ETSU CHEMICAL CO., LTD. (JP) | 2005-01-04 | — | — | US | disclosed |
| US-6682869-B2 | IN POLYMER | SHIN-ETU CHEMICAL CO., LTD. (JP) | 2004-01-27 | — | — | US | disclosed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | disclosed |
| US-6416928-B1 | HALOGENONIUM OR SULFONIUM SALTS OF SULFONATED DIPHENYLALKANE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| US-6395446-B1 | CONTAINING SULFONYLDIAZOMETHANE COMPOUND AS ACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-28 | — | — | US | disclosed |
| US-20020042017-A1 | Chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-11 | — | — | US | disclosed |
| US-6338931-B1 | PHOTOACID GENERATOR OF SULFONYLDIAZOMETHANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-15 | — | — | US | disclosed |
| US-20010038971-A1 | Chemical amplification, positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010033994-A1 | Chemical amplification, positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |