Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL29619475 | 1.00 | — | — | |
| Sulfuric Acid SCHEMBL17938190 | 0.95 | TSHR (0.67) | — | |
| Sulfuric Acid SCHEMBL23925501 | 0.95 | — | — | |
| Sulfuric Acid SCHEMBL5550096 | 0.95 | TSHR (0.80) | — | |
| Sulfuric Acid SCHEMBL7162371 | 0.95 | TSHR (0.80) | — | |
| Sulfuric Acid SCHEMBL35941 | 0.95 | — | — | |
| Sulfuric Acid SCHEMBL11042555 | 0.91 | TSHR (0.75) | — | |
| Sulfuric Acid SCHEMBL11297734 | 0.91 | TSHR (0.61) | — | |
| Sulfuric Acid SCHEMBL28489912 | 0.91 | TSHR (0.61) | — | |
| Sulfuric Acid SCHEMBL11299765 | 0.91 | TSHR (0.61) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106800510-A | The production method of dimethyl succinate | 上海唯稳实业有限公司 | 2017-06-06 | — | — | CN | claimed |
| EP-1022266-B1 | Process for the production of secondary alkoxy-1-alkenes | CREANOVA INC (US) | 2003-05-14 | — | — | EP | claimed |
| US-6235944-B1 | REACTION OF KETONE WITH ORTHOFORMATE ESTER AND ALKANOL, ACID CATALYST, AGITATION AND RECOVERING SECONDARY ALKOXY-1-ALKENE | CREANOVA INC. | 2001-05-22 | — | — | US | claimed |
| EP-1022266-A1 | Process for the production of secondary alkoxy-1-alkenes | Creanova Inc. (US) | 2000-07-26 | — | — | EP | claimed |
| US-20250257094-A1 | METHODS FOR PRODUCING CYCLIC COMPOUNDS COMPRISING N-SUBSTITUTED AMINO ACID RESIDUES | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2025-08-14 | — | — | US | disclosed |
| US-12312379-B2 | Methods for producing cyclic compounds comprising N-substituted amino acid residues | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2025-05-27 | — | — | US | disclosed |
| CN-118373739-A | Method and device for synthesizing dimethyl succinate by continuously applying fractions | 上海东庚化工技术有限公司 | 2024-07-23 | — | — | CN | disclosed |
| US-20240050577-A1 | CDK INHIBITORS AND PHARMACEUTICAL USES THEREOF | RISEN (SHANGHAI) PHARMA ENG CO., LTD. (CN) | 2024-02-15 | — | — | US | disclosed |
| CN-117279928-A | Process for the preparation of cyclic compounds comprising N-substituted amino acid residues | 中外制药株式会社 | 2023-12-22 | — | — | CN | disclosed |
| WO-2023205892-A1 | CDK INHIBITORS AND PHARMACEUTICAL USES THEREOF | Risen (Suzhou) Pharma Tech Co., Ltd. (CN) | 2023-11-02 | — | — | WO | disclosed |
| CN-115444985-B | Adenosine triphosphate high-energy bone repair material and preparation method thereof | 中鼎凯瑞科技成都有限公司 | 2023-09-26 | — | — | CN | disclosed |
| US-11543399-B2 | Reagents for enhanced detection of low volatility analytes | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2023-01-03 | — | — | US | disclosed |
| CN-106800510-A | The production method of dimethyl succinate | 上海唯稳实业有限公司 | 2017-06-06 | — | — | CN | disclosed |
| WO-2015154087-A1 | REAGENTS FOR ENHANCED DETECTION OF LOW VOLATILITY ANALYTES | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2015-10-08 | — | — | WO | disclosed |
| US-20150285780-A1 | Reagents For Enhanced Detection Of Low Volatility Analytes | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2015-10-08 | — | — | US | disclosed |
| WO-2006112533-A1 | WATER-CONTAINING GEL FORM AND PRODUCTION METHOD THEREOF | SHOWA DENKO K.K. (JP) | 2006-10-26 | — | — | WO | disclosed |
| US-6827997-B2 | Pressure-sensitive adhesive sheet and covered structure | LINTEC CORPORATION (JP) | 2004-12-07 | — | — | US | disclosed |
| US-20020155244-A1 | Pressure-sensitive adhesive sheet and covered structure | LINTEC CORPORATION (JP) | 2002-10-24 | — | — | US | disclosed |
| EP-1178095-A1 | PRESSURE-SENSITIVE ADHESIVE SHEET AND COVERED STRUCTURE | LINTEC Corporation (JP) | 2002-02-06 | — | — | EP | disclosed |
| US-4045222-A | OXYACID OF CHLORINE AND SALT THEREOF | FUJI PHOTO FILM CO., LTD. (JA) | 1977-08-30 | — | — | US | disclosed |