⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL11056064 | 0.82 | CA4 (0.33) | — | |
| Fluoride Ion SCHEMBL1565216 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL29150484 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL4071926 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL21747504 | 0.82 | CA4 (0.33) | — | |
| Fluoride SCHEMBL11139880 | 0.82 | — | — | |
| Fluoride Ion SCHEMBL28001640 | 0.82 | CA4 (0.33) | — | |
| SCHEMBL29395373 | 0.71 | — | — | |
| SCHEMBL19991555 | 0.71 | — | — | |
| SCHEMBL429074 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2713 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122051184-A | Composite positive electrode material, preparation method thereof, positive electrode plate and lithium ion battery | 惠州亿纬锂能股份有限公司 | 2026-05-15 | — | — | CN | claimed |
| US-20260110958-A1 | MASKS, METHODS OF MANUFACTURING MASKS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-23 | — | — | US | claimed |
| US-12532674-B2 | Methods and apparatus for depositing a chalcogenide film and structures including the film | ASM IP HOLDING B.V. (NL) | 2026-01-20 | — | — | US | claimed |
| US-12509765-B2 | Method and system for depositing transition metal carbide | ASM IP HOLDING B.V. (NL) | 2025-12-30 | — | — | US | claimed |
| US-20250357120-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE INCLUDING PLASMA ETCHING PROCESS | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-11-20 | — | — | US | claimed |
| EP-4634117-A1 | ACTIVE ELECTRODE MATERIAL | Echion Technologies Limited (GB) | 2025-10-22 | — | — | EP | claimed |
| US-20250305133-A1 | METHOD, SYSTEM AND APPARATUS FOR N-METAL FILM DEPOSITION | ASM IP HOLDING B.V. (NL) | 2025-10-02 | — | — | US | claimed |
| US-20250282699-A1 | METHOD FOR PRODUCING 1,1,1,3,5,5,5-HEPTAFLUORO-2-PENTENE | KANTO DENKA KOGYO CO., LTD. (JP) | 2025-09-11 | — | — | US | claimed |
| US-12410368-B2 | Etching gas composition, substrate processing apparatus, and pattern forming method using the etching gas composition | SEMES CO., LTD. (KR) | 2025-09-09 | — | — | US | claimed |
| US-20250230544-A1 | DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES | APPLIED MATERIALS, INC. (US) | 2025-07-17 | — | — | US | claimed |
| US-4058575-A | TANTALUM ANDOR NIOBIUM PENTAFLUORIDE CATALYST | EXXON RESEARCH & ENGINEERING CO. (US) | 1977-11-15 | — | — | US | claimed |
| US-4048251-A | Autorefrigerated isomerization process | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1977-09-13 | — | — | US | claimed |
| US-4043900-A | TANTALUM OR NIOBIUM PENTAFLUORIDE, HYDROGEN FLUORIDE | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1977-08-23 | — | — | US | claimed |
| US-4036738-A | WITH BORON, TANTALUM, OR NIOBIUM FLUORIDE | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1977-07-19 | — | — | US | claimed |
| US-4036737-A | WITH BORON, TANTALUM, OR NIOBIUM FLUORIDE | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1977-07-19 | — | — | US | claimed |
| US-4029556-A | ELECTRODEPOSITION OF ALLOY | MONACO EMLEE | 1977-06-14 | — | — | US | claimed |
| US-4025459-A | Noble metal hydrogenation catalysts promoted by fluoride containing acids | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1977-05-24 | — | — | US | claimed |
| US-4025577-A | Hydroalkylation of paraffins with olefins utilizing hydrogen fluoride and metal pentafluoride catalyst | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1977-05-24 | — | — | US | claimed |
| US-3948761-A | NIOBIUM, TANTALUM, MOLYBDENUM, GALLIUM OR TUNGSTEN HALIDE CATALYST | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1976-04-06 | — | — | US | claimed |
| US-3933931-A | PERFLUOROETHYL IODIDE FROM IODINE, IODINE PENTAFLUORIDE AND TETRAFLUOROETHYLENE, NIOBIUM, TANTALUM, MOLYBDENUM OR BORON FLUORIDE CATALYST | ASAHI GLASS CO., LTD. (JA) | 1976-01-20 | — | — | US | claimed |