Fluoride

Fluoride

SCHEMBL57423

F.[Nb]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL2542738 1.00
Fluoride SCHEMBL7802476 1.00
Fluoride SCHEMBL10496288 1.00
Fluoride SCHEMBL665730 1.00
Fluoride SCHEMBL9347827 1.00
Fluoride SCHEMBL21747502 0.82
Hydrochloric Acid SCHEMBL28844924 0.82
Fluoride SCHEMBL1565215 0.82
Fluoride SCHEMBL4071925 0.82
Fluoride SCHEMBL9065602 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1952 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122051184-A Composite positive electrode material, preparation method thereof, positive electrode plate and lithium ion battery 惠州亿纬锂能股份有限公司 2026-05-15 CN claimed
US-20260110958-A1 MASKS, METHODS OF MANUFACTURING MASKS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-04-23 US claimed
US-20250357120-A1 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE INCLUDING PLASMA ETCHING PROCESS SAMSUNG ELECTRONICS CO LTD (KR) 2025-11-20 US claimed
EP-4634117-A1 ACTIVE ELECTRODE MATERIAL Echion Technologies Limited (GB) 2025-10-22 EP claimed
US-12410368-B2 Etching gas composition, substrate processing apparatus, and pattern forming method using the etching gas composition SEMES CO., LTD. (KR) 2025-09-09 US claimed
US-20250230544-A1 DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES APPLIED MATERIALS, INC. (US) 2025-07-17 US claimed
WO-2025151418-A1 DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FILMS ON SEMICONDUCTOR SUBSTRATES APPLIED MATERIALS, INC. (US) 2025-07-17 WO claimed
US-20250183054-A1 SELECTIVE BOTTOM-UP FILL ASM IP HOLDING B.V. (NL) 2025-06-05 US claimed
CN-120072744-A Selective bottom-up filling ASM IP私人控股有限公司 2025-05-30 CN claimed
CN-119994032-A Modified ternary positive electrode material, and preparation method and application thereof 合肥国轩高科动力能源有限公司 2025-05-13 CN claimed
EP-1187239-A2 Nickel electrode for alkaline storage battery, method of fabricating the same, and alkaline storage battery SANYO ELECTRIC Co., Ltd. (JP) 2002-03-13 EP claimed
EP-1071652-A1 PROCESS FOR THE GENERATION OF ALPHA,BETA-UNSATURATED CARBOXYLIC ACIDS AND ESTERS USING NIOBIUM CATALYST EASTMAN CHEMICAL COMPANY (US) 2001-01-31 EP claimed
US-5998657-A REACTING AN ACID OR ESTER WITH ALCOHOL AND OXYGEN EASTMAN CHEMICAL COMPANY (US) 1999-12-07 US claimed
WO-1999052854-A1 PROCESS FOR THE GENERATION OF α,β-UNSATURATED CARBOXYLIC ACIDS AND ESTERS USING NIOBIUM CATALYST EASTMAN CHEMICAL COMPANY (US) 1999-10-21 WO claimed
US-5209910-A Digestion with hydrofluoric acid, solvent extraction with methyl isobutyl ketone HERMANN C. STARCK GMBH & CO. KG (DE) 1993-05-11 US claimed
CN-1059320-A The preparation of anhydrous five niobium fluoride and tantalum pentafluoride DU PONT (US) 1992-03-11 CN claimed
US-4965055-A Preparation of ultra-pure metal halides THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) 1990-10-23 US claimed
US-4029556-A ELECTRODEPOSITION OF ALLOY MONACO EMLEE 1977-06-14 US claimed
US-4025459-A Noble metal hydrogenation catalysts promoted by fluoride containing acids EXXON RESEARCH AND ENGINEERING COMPANY (US) 1977-05-24 US claimed
US-3933931-A PERFLUOROETHYL IODIDE FROM IODINE, IODINE PENTAFLUORIDE AND TETRAFLUOROETHYLENE, NIOBIUM, TANTALUM, MOLYBDENUM OR BORON FLUORIDE CATALYST ASAHI GLASS CO., LTD. (JA) 1976-01-20 US claimed