SCHEMBL575287

SCHEMBL575287

CC[N+]1(CC)CCOCC1

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CHRNA7 P36544 2/20 0.37
CTDSP1 Q9GZU7 2/20 0.33
CHRNA10 Q9GZZ6 2/20 0.31
CHRNA9 Q9UGM1 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL9011443 0.97 CTDSP1 (0.36) CHRNA7CTDSP1CHRNA10CHRNA9
Bromide SCHEMBL19439575 0.97 CHRNA7 (0.35) CHRNA7CTDSP1CHRNA10CHRNA9
SCHEMBL9935154 0.88 CTDSP1 (0.32) CHRNA7CTDSP1
SCHEMBL9935984 0.88 CTDSP1 (0.35) CHRNA7CTDSP1
SCHEMBL18526268 0.84 CTDSP1 (0.33) CTDSP1
SCHEMBL2100281 0.84 CTDSP1 (0.44) CTDSP1
SCHEMBL9936322 0.84 HPGD (0.34) CTDSP1
SCHEMBL4755269 0.83 CTDSP1 (0.31) CTDSP1
Bromide SCHEMBL28941734 0.82 CTDSP1 (0.42) CTDSP1
Iodide SCHEMBL9179010 0.82 CTDSP1 (0.46) CTDSP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 240 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8864883-B2 Surface treatments for dessicant media in a water recovery device Z124 (KY) 2014-10-21 US claimed
US-8808424-B2 Apparatus and method for removing CO2 from a production plant discharge MUNTERS CORPORATION (US) 2014-08-19 US claimed
EP-2673068-A1 Apparatus and method for removing co2 from a production plant discharge Munters Corporation (US) 2013-12-18 EP claimed
US-20130319022-A1 SURFACE TREATMENTS FOR DESSICANT MEDIA IN A WATER RECOVERY DEVICE Z124 (KY) 2013-12-05 US claimed
US-20120204717-A1 APPARATUS AND METHOD FOR REMOVING CO2 FROM A PRODUCTION PLANT DISCHARGE MUNTERS CORPORATION (US) 2012-08-16 US claimed
WO-2012109547-A1 APPARATUS AND METHOD FOR REMOVING CO2 FROM A PRODUCTION PLANT DISCHARGE MUNTERS CORPORATION (US) 2012-08-16 WO claimed
US-20110247494-A1 LIQUID SORBANT, METHOD OF USING A LIQUID SORBANT, AND DEVICE FOR SORBING A GAS VTU Holding GmbH. (AT) 2011-10-13 US claimed
US-4144130-A PARTITIONING IN A MULTIPHASE SYSTEM GESELLSCHAFT FUR BIOTECHNOLOGISCHE FORSCHUNG (DE) 1979-03-13 US claimed
JP-2025013-A None JP disclosed
US-12379525-B2 Plastic lens DAICEL CORPORATION (JP) 2025-08-05 US disclosed
US-20250242575-A1 HARDCOAT-LESS FILM, LAMINATE, MULTILAYER LAMINATE, AND DISPLAY DEVICE DAICEL CORPORATION (JP) 2025-07-31 US disclosed
US-20250248279-A1 TRANSPARENT LAMINATE, IMAGE DISPLAY DEVICE, AND FLEXIBLE DEVICE DAICEL CORPORATION (JP) 2025-07-31 US disclosed
US-20250248280-A1 LAMINATE, LAMINATED FILM, IMAGE DISPLAY DEVICE, AND FOLDABLE DEVICE DAICEL CORPORATION (JP) 2025-07-31 US disclosed
US-20250243110-A1 CURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE, AND DISPLAY DEVICE DAICEL CORPORATION (JP) 2025-07-31 US disclosed
EP-1394824-A1 ELECTROLYTIC SOLUTION FOR ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR USING IT Mitsubishi Chemical Corporation (JP) 2004-03-03 EP disclosed
US-5009811-A Containing tetracyanoquinodimethan complex salts, thermo-plastic polymers, acetals, ortho acid esters, disiloxanes, silyl esters and acids, solvent and surfactants NITTO CHEMICAL INDUSTRY COMPANY, LTD. (JP) 1991-04-23 US disclosed
JP-H0225013-A ELECTROLYTE FOR ELECTROLYTIC CAPACITOR NIPPON CHEMICON CORP 1990-01-26 JP disclosed
EP-0340421-A2 Conducting varnish composition NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1989-11-08 EP disclosed
US-4762633-A Electrolyte for electrolytic capacitor NIPPON CHEMI-CON CORPORATION (JP) 1988-08-09 US disclosed
US-4144130-A PARTITIONING IN A MULTIPHASE SYSTEM GESELLSCHAFT FUR BIOTECHNOLOGISCHE FORSCHUNG (DE) 1979-03-13 US disclosed