⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL576250 | 0.84 | — | — | |
| SCHEMBL10954696 | 0.79 | — | — | |
| SCHEMBL9478340 | 0.79 | — | — | |
| SCHEMBL10946211 | 0.79 | — | — | |
| SCHEMBL9504436 | 0.79 | — | — | |
| SCHEMBL22035401 | 0.77 | — | — | |
| SCHEMBL390363 | 0.75 | — | — | |
| SCHEMBL2108883 | 0.75 | — | — | |
| SCHEMBL576107 | 0.74 | — | — | |
| SCHEMBL13332427 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6841332-B2 | Photoresist compound and method for structuring a photoresist layer | INFINEON TECHNOLOGY AG (DE) | 2005-01-11 | — | — | US | claimed |
| US-20030022111-A1 | Photoresist compound and method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2003-01-30 | — | — | US | claimed |
| US-20240297344-A1 | NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-09-05 | — | — | US | disclosed |
| CN-115911573-A | Nonaqueous electrolyte solution for secondary battery and nonaqueous electrolyte secondary battery using same | 三菱化学株式会社 | 2023-04-04 | — | — | CN | disclosed |
| US-11616253-B2 | Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-03-28 | — | — | US | disclosed |
| US-20220278370-A1 | NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-09-01 | — | — | US | disclosed |
| US-11367899-B2 | Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-06-21 | — | — | US | disclosed |
| CN-106848406-B | Nonaqueous electrolyte solution for secondary battery and nonaqueous electrolyte secondary battery | 三菱化学株式会社 | 2020-09-11 | — | — | CN | disclosed |
| CN-111048841-A | Nonaqueous electrolyte solution for secondary battery and nonaqueous electrolyte secondary battery using same | 三菱化学株式会社 | 2020-04-21 | — | — | CN | disclosed |
| CN-105633345-B | Nonaqueous electrolyte solution for secondary battery and nonaqueous electrolyte secondary battery using same | 三菱化学株式会社 | 2020-01-17 | — | — | CN | disclosed |
| US-10468720-B2 | Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-11-05 | — | — | US | disclosed |
| EP-0487693-B1 | DINITRAMIDE SALTS AND METHOD OF MAKING SAME | STANFORD RES INST INT (US) | 1995-01-18 | — | — | EP | disclosed |
| US-5254324-A | Oxidizers in rocket fuels | SRI INTERNATIONAL (US) | 1993-10-19 | — | — | US | disclosed |
| EP-0337188-B1 | BINDER,SOLUBLE IN AQUEOUS ALKALI,CONTAINING SILANYL GROUPS IN THE SIDE CHAIN,METHOD FOR ITS PREPARATION AND LIGHT-SENSITIVE COMPOSITION CONTAINING THAT COMPOUND | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-07-07 | — | — | EP | disclosed |
| US-5206111-A | Resistant to plasma etching | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-04-27 | — | — | US | disclosed |
| US-5162559-A | SILYLATION REAGENTS FOR PREPARING BINDERS WHICH ARE SOLUBLE IN AQUEOUS ALKALI AND CONTAIN SILANYL GROUPS IN THE SIDE CHAIN | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-11-10 | — | — | US | disclosed |
| EP-0487693-A1 | DINITRAMIDE SALTS AND METHOD OF MAKING SAME. | STANFORD RES INST INT (US) | 1992-06-03 | — | — | EP | disclosed |
| WO-1991019669-A1 | DINITRAMIDE SALTS AND METHOD OF MAKING SAME | SRI INTERNATIONAL (US) | 1991-12-26 | — | — | WO | disclosed |
| US-5008362-A | Binders soluble in aqueous alkali and containing silanyl groups in the side chain, process for preparing same and also photosensitive mixture containing these compounds | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-04-16 | — | — | US | disclosed |
| EP-0337188-A1 | Binder,soluble in aqueous alkali,containing silanyl groups in the side chain,method for its preparation and light-sensitive composition containing that compound | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-10-18 | — | — | EP | disclosed |