SCHEMBL576989

SCHEMBL576989

C=CS(=O)(=O)OS(=O)(=O)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4345143 0.81 USP2 (0.35)
SCHEMBL8878548 0.77
SCHEMBL11240174 0.77
SCHEMBL10614132 0.74
SCHEMBL502500 0.72
SCHEMBL5574864 0.72
SCHEMBL252233 0.72
SCHEMBL297922 0.72
SCHEMBL2527125 0.72
SCHEMBL28362165 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 448 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11649205-B2 Vinylsulfonic anhydride, method for producing same, and method for producing vinylsulfonyl fluoride ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-05-16 US claimed
EP-3822256-B1 VINYLSULFONIC ANHYDRIDE, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING VINYLSULFONYL FLUORIDE ASAHI CHEMICAL IND (JP) 2022-08-03 EP claimed
CN-111954662-B Vinyl sulfonic anhydride, process for producing the same, and process for producing vinyl sulfonyl fluoride 旭化成株式会社 2022-06-14 CN claimed
EP-3822256-A1 VINYLSULFONIC ANHYDRIDE, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING VINYLSULFONYL FLUORIDE Asahi Kasei Kabushiki Kaisha (JP) 2021-05-19 EP claimed
CN-111954662-A Vinyl sulfonic anhydride, process for producing the same, and process for producing vinyl sulfonyl fluoride 旭化成株式会社 2020-11-17 CN claimed
WO-2020012913-A1 VINYLSULFONIC ANHYDRIDE, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING VINYLSULFONYL FLUORIDE 旭化成株式会社 2020-01-16 WO claimed
US-20160122618-A1 COMPOSITIONS INCLUDING A PARTICULATE BRIDGING AGENT AND FIBERS AND METHODS OF TREATING A SUBTERRANEAN FORMATION WITH THE SAME HALLIBURTON ENERGY SERVICES, INC. 2016-05-05 US claimed
WO-2016022113-A1 DIVERTER COMPOSITION INCLUDING RHEOLOGICALLY-MODIFIED INVERT EMULSION HALLIBURTON ENERGY SERVICES, INC. (US) 2016-02-11 WO claimed
WO-2015061342-A1 METHODS FOR TREATMENT OF A SUBTERRANEAN FORMATION HALLIBURTON ENERGY SERVICES, INC. (US) 2015-04-30 WO claimed
WO-2015041679-A1 DRILLING FLUID COMPOSITION INCLUDING VISCOSIFIER AND METHOD OF USING THE SAME HALLIBURTON ENERGY SERVICES, INC. (US) 2015-03-26 WO claimed
WO-2015034488-A1 HYDROLYZABLE COMPOUNDS FOR TREATMENT OF A SUBTERRANEAN FORMATION AND METHODS OF USING THE SAME HALLIBURTON ENERGY SERVICES, INC. (US) 2015-03-12 WO claimed
EP-0958938-B1 Inkjet images printed on polyvinyl alcohol (PVA) and overcoated with a hardener solution EASTMAN KODAK CO (US) 2003-04-09 EP claimed
US-12291952-B2 In-reservoir cleanup operations through exothermic reaction following a fracturing operation Saudi Arabia (SA) 2025-05-06 US disclosed
US-20250101841-A1 IN-RESERVOIR CLEANUP OPERATIONS THROUGH EXOTHERMIC REACTION FOLLOWING A FRACTURING OPERATION SAUDI ARABIAN OIL COMPANY (SA) 2025-03-27 US disclosed
CN-110870112-B Lithium ion secondary battery 日本电气株式会社 2024-09-20 CN disclosed
US-20240297344-A1 NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-05 US disclosed
US-4142899-A SILVER HALIDE PHOTOSENSITIVE ELEMENT, IMAGE RECEIVING LAYER CONTAINING COPOLYMER WITH A QUATERNARY AMMONIUM MONOMER AND A FLUORINE CONTAINING MONOMER KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1979-03-06 US disclosed
US-4126461-A NONDIFFUSIBLE RESORCINOL COUPLER EASTMAN KODAK COMPANY (US) 1978-11-21 US disclosed
US-4062681-A Electrophotographic element having a hydrophobic, cured, highly cross-linked polymeric overcoat layer EASTMAN KODAK COMPANY (US) 1977-12-13 US disclosed
US-3993809-A THERMOGRAPHIC FILM, LIQUID CRYSTALS, ANTIREFLECTION LAYER AGFA-GEVAERT, A.G. (DT) 1976-11-23 US disclosed