⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18420104 | 0.78 | — | — | |
| SCHEMBL10441440 | 0.78 | — | — | |
| SCHEMBL3655675 | 0.78 | — | — | |
| SCHEMBL5146932 | 0.78 | — | — | |
| SCHEMBL1155750 | 0.76 | — | — | |
| SCHEMBL5438 | 0.75 | — | — | |
| SCHEMBL18419947 | 0.73 | — | — | |
| SCHEMBL1141891 | 0.71 | — | — | |
| SCHEMBL19878502 | 0.71 | — | — | |
| SCHEMBL105367 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 499 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109563243-B | Fluorine atom-containing polymer and use thereof | 日产化学株式会社 | 2022-07-08 | — | — | CN | claimed |
| EP-3168250-B1 | FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF | NISSAN CHEMICAL CORP (JP) | 2020-02-26 | — | — | EP | claimed |
| CN-109563243-A | Polymer and its application containing fluorine atom | 日产化学株式会社 | 2019-04-02 | — | — | CN | claimed |
| US-10199578-B2 | Fluorine-atom-containing polymer and use thereof | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-02-05 | — | — | US | claimed |
| CN-106132917-B | Triarylamine derivatives and its utilization | 日产化学工业株式会社 | 2019-01-08 | — | — | CN | claimed |
| US-20170200897-A1 | FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-07-13 | — | — | US | claimed |
| EP-3168250-A1 | FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF | Nissan Chemical Industries, Ltd. (JP) | 2017-05-17 | — | — | EP | claimed |
| EP-3124466-A1 | TRIARYLAMINE DERIVATIVE AND USE OF SAME | Nissan Chemical Industries, Ltd. (JP) | 2017-02-01 | — | — | EP | claimed |
| CN-106132917-A | Triarylamine derivatives and utilization thereof | 日产化学工业株式会社 | 2016-11-16 | — | — | CN | claimed |
| EP-1463708-B1 | MANUFACTURE OF TRIMETHYLHYDROQUINONE DIACYLATES | DSM IP ASSETS BV (NL) | 2011-11-09 | — | — | EP | claimed |
| EP-1574530-B1 | TETRAFLUOROETHYLENE COPOLYMER | ASAHI GLASS CO LTD (JP) | 2008-08-13 | — | — | EP | claimed |
| US-7153994-B2 | Manufacture of trimethylhydroquinone diacylates | DSM IP ASSETS B.V. (NL) | 2006-12-26 | — | — | US | claimed |
| US-20050038286-A1 | Manufacture of trimethylhydroquinone diacylates | DSM IP ASSETS B.V. (NL) | 2005-02-17 | — | — | US | claimed |
| EP-1463708-A1 | MANUFACTURE OF TRIMETHYLHYDROQUINONE DIACYLATES | DSM IP Assets B.V. (NL) | 2004-10-06 | — | — | EP | claimed |
| WO-2003051812-A1 | MANUFACTURE OF TRIMETHYLHYDROQUINONE DIACYLATES | DSM IP ASSETS B.V. (NL) | 2003-06-26 | — | — | WO | claimed |
| US-12046390-B2 | Dopant, electroconductive composition and method for producing same | THE UNIVERSITY OF TOKYO (JP) | 2024-07-23 | — | — | US | disclosed |
| US-20240231226-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-11 | — | — | US | disclosed |
| EP-0713131-A2 | Silver halide photographic material | FUJI PHOTO FILM CO., LTD. (JP) | 1996-05-22 | — | — | EP | disclosed |
| EP-0422822-B1 | LUBRICATING OIL COMPOSITIONS | NIPPON OIL CO. LTD. (JP) | 1993-08-11 | — | — | EP | disclosed |
| EP-0422822-A1 | Lubricating oil compositions | NIPPON OIL CO. LTD. (JP) | 1991-04-17 | — | — | EP | disclosed |