⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19540994 | 1.00 | — | — | |
| SCHEMBL19466285 | 1.00 | — | — | |
| SCHEMBL28033 | 1.00 | — | — | |
| SCHEMBL996894 | 0.84 | — | — | |
| SCHEMBL28278 | 0.84 | — | — | |
| SCHEMBL29224 | 0.84 | — | — | |
| SCHEMBL13523752 | 0.83 | — | — | |
| SCHEMBL19090009 | 0.83 | — | — | |
| SCHEMBL6255420 | 0.83 | — | — | |
| SCHEMBL15014655 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 346 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260008903-A1 | POLYTHIOL COMPOSITION AND USE THEREOF | Efirm New Material Co., Ltd. (CN) | 2026-01-08 | — | — | US | claimed |
| EP-4423165-B1 | A POLYMER BEING SUITABLE AS INERT COMPONENT OF A RADIATION CURING COATING AND IN PARTICULAR OF A RADIATION CURING INK | HUBERGROUP DEUTSCHLAND GMBH (DE) | 2025-09-24 | — | — | EP | claimed |
| CN-120040703-A | Polythiol composition, polymerizable composition for optical product, and optical product | 益丰新材料股份有限公司 | 2025-05-27 | — | — | CN | claimed |
| CN-116768847-B | Thiol composition and application thereof in optical material | 益丰新材料股份有限公司 | 2025-04-29 | — | — | CN | claimed |
| CN-119751323-A | Preparation method of polythiol compound | 益丰新材料股份有限公司 | 2025-04-04 | — | — | CN | claimed |
| US-20250034320-A1 | A polymer being suitable as inert component of a radiation curing coating and in particular of a radiation curing ink | HUBERGROUP DEUTSCHLAND GMBH (DE) | 2025-01-30 | — | — | US | claimed |
| CN-118684609-A | Polythiol compound for avoiding explosion polymerization and material leakage and application thereof | 益丰新材料股份有限公司 | 2024-09-24 | — | — | CN | claimed |
| WO-2024188359-A1 | POLYTHIOL COMPOSITION AND USE THEREOF | 益丰新材料股份有限公司 | 2024-09-19 | — | — | WO | claimed |
| EP-4423165-A1 | A POLYMER BEING SUITABLE AS INERT COMPONENT OF A RADIATION CURING COATING AND IN PARTICULAR OF A RADIATION CURING INK | hubergroup Deutschland GmbH (DE) | 2024-09-04 | — | — | EP | claimed |
| CN-117285688-B | Polythiol composition and application thereof | 益丰新材料股份有限公司 | 2024-08-30 | — | — | CN | claimed |
| CN-117186057-A | Polythiol composition and application thereof | 益丰新材料股份有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-116903812-A | Thiol ester composition, optical resin and optical resin product | 益丰新材料股份有限公司 | 2023-10-20 | — | — | CN | claimed |
| CN-116768847-A | Thiol composition and application thereof in optical material | 益丰新材料股份有限公司 | 2023-09-19 | — | — | CN | claimed |
| CN-116640361-A | Release agent composition and application thereof | 益丰新材料股份有限公司 | 2023-08-25 | — | — | CN | claimed |
| WO-2023147792-A1 | POLYTHIOL COMPOSITION AND USE THEREOF | 益丰新材料股份有限公司 | 2023-08-10 | — | — | WO | claimed |
| WO-2023094257-A1 | A POLYMER BEING SUITABLE AS INERT COMPONENT OF A RADIATION CURING COATING AND IN PARTICULAR OF A RADIATION CURING INK | HUBERGROUP DEUTSCHLAND GMBH (DE) | 2023-06-01 | — | — | WO | claimed |
| CN-114790269-A | Polythiol composition and application thereof | 益丰新材料股份有限公司 | 2022-07-26 | — | — | CN | claimed |
| US-11377433-B2 | Method for producing polyfunctional sulfur-containing epoxy compound | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-07-05 | — | — | US | claimed |
| EP-0976727-B1 | Polyisocyanate compound, process for producing the same and optical resin materials using the same | HOYA CORP (JP) | 2003-01-15 | — | — | EP | claimed |
| US-6117923-A | OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-09-12 | — | — | US | claimed |