⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL581206 | 0.92 | — | — | |
| SCHEMBL766223 | 0.77 | — | — | |
| SCHEMBL21936312 | 0.74 | — | — | |
| SCHEMBL3899073 | 0.74 | — | — | |
| SCHEMBL5932604 | 0.74 | — | — | |
| SCHEMBL11280434 | 0.72 | — | — | |
| SCHEMBL201821 | 0.72 | — | — | |
| SCHEMBL5932351 | 0.70 | — | — | |
| SCHEMBL3713513 | 0.70 | GAA (0.34) | — | |
| SCHEMBL3035968 | 0.70 | GAA (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 289 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107963982-B | Polyisocyanate composition and isocyanate polymer composition | 旭化成株式会社 | 2021-11-12 | — | — | CN | claimed |
| CN-118215651-A | Method for producing isocyanate compound, method for producing urethane compound, method for recovering amine compound, and isocyanate composition | 旭化成株式会社 | 2024-06-18 | — | — | CN | disclosed |
| WO-2024071129-A1 | ACTIVE ESTER RESIN, EPOXY RESIN COMPOSITION AND CURED PRODUCT THEREOF, PREPREG, LAMINATED BOARD, AND BUILD-UP FILM | 日鉄ケミカル＆マテリアル株式会社 | 2024-04-04 | — | — | WO | disclosed |
| US-11807711-B2 | Phenoxy resin, resin composition including same, cured object obtained therefrom, and production method therefor | NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) | 2023-11-07 | — | — | US | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230273521-A1 | CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230229084-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| EP-2435497-B1 | POLYCYCLIC DITHIOPHENES | CLAP CO LTD (KR) | 2023-07-05 | — | — | EP | disclosed |
| US-5516920-A | POLYMER STABILIZERS | CIBA-GEIGY CORPORATION (US) | 1996-05-14 | — | — | US | disclosed |
| US-5457204-A | For polymers | CIBA-GEIGY CORPORATION (US) | 1995-10-10 | — | — | US | disclosed |
| EP-0648765-A1 | Process for the production of 3-arylbenzofuranones | CIBA-GEIGY AG (CH) | 1995-04-19 | — | — | EP | disclosed |
| EP-0638597-A1 | Polymeric adults of hindered amine-epoxydes as stabilizers | CIBA-GEIGY AG (CH) | 1995-02-15 | — | — | EP | disclosed |
| EP-0634399-A1 | Adducts of hindered amine-epoxides as stabilisers | CIBA-GEIGY AG (CH) | 1995-01-18 | — | — | EP | disclosed |
| EP-0634449-A2 | Polyether with sterically hindered amine side chains as stabilizing agents | CIBA-GEIGY AG (CH) | 1995-01-18 | — | — | EP | disclosed |
| EP-0634450-A2 | Polyether with releasably bound sterically hindered amines as stabilizing agents | CIBA-GEIGY AG (CH) | 1995-01-18 | — | — | EP | disclosed |
| US-5340701-A | Photoinitiators | CIBA-GEIGY CORPORATION (US) | 1994-08-23 | — | — | US | disclosed |
| EP-0565488-A1 | Fluorine free titanocenes and their application | CIBA-GEIGY AG (CH) | 1993-10-13 | — | — | EP | disclosed |
| EP-0373643-A2 | Near infrared absorbers and display/recording materials prepared by using same | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1990-06-20 | — | — | EP | disclosed |