SCHEMBL5817818

SCHEMBL5817818

C(CCOCCCCCC1CCC2OC2C1)CCC1CCC2OC2C1

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 1/20 0.32
PTGS2 P35354 1/20 0.32
SPHK2 Q9NRA0 2/20 0.30
SPHK1 Q9NYA1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5822582 0.98 PTGS1 (0.32) PTGS1PTGS2
SCHEMBL5821286 0.92 PTGS1 (0.33) PTGS1PTGS2
SCHEMBL21219899 0.88 PTGS1 (0.33) PTGS1PTGS2
SCHEMBL5818298 0.86 PTGS1 (0.33) PTGS1PTGS2
SCHEMBL28389189 0.85 PTGS1 (0.30) PTGS1PTGS2
SCHEMBL10771045 0.83 PTGS1 (0.33) PTGS1PTGS2
SCHEMBL29581677 0.82 TSHR (0.39) SPHK2SPHK1
SCHEMBL4807551 0.82
SCHEMBL14256262 0.82 EPHX2 (0.32) PTGS1PTGS2
SCHEMBL4809001 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1632794-A2 Radiation sensitive resin composition for forming microlens JSR Corporation (JP) 2006-03-08 EP disclosed
US-20060008735-A1 Radiation sensitive resin composition for forming microlens JSR CORPORATION (JP) 2006-01-12 US disclosed