⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4389610 | 0.97 | — | — | |
| SCHEMBL459598 | 0.83 | — | — | |
| SCHEMBL16666846 | 0.76 | — | — | |
| SCHEMBL2149515 | 0.74 | — | — | |
| SCHEMBL28838075 | 0.72 | — | — | |
| SCHEMBL21197635 | 0.70 | — | — | |
| SCHEMBL16289848 | 0.70 | — | — | |
| SCHEMBL434413 | 0.69 | — | — | |
| SCHEMBL28430990 | 0.67 | — | — | |
| SCHEMBL28839608 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2016050786-A1 | COSMETIC PROCESS FOR ATTENUATING WRINKLES | L'OREAL (FR) | 2016-04-07 | — | — | WO | claimed |
| WO-2016050788-A1 | COSMETIC PROCESS FOR ATTENUATING WRINKLES | L'OREAL (FR) | 2016-04-07 | — | — | WO | claimed |
| WO-2024135400-A1 | CURABLE RESIN COMPOSITION AND PROCESSED PRODUCT OF SAME | 株式会社スリーボンド | 2024-06-27 | — | — | WO | disclosed |
| WO-2024095924-A1 | PHOTOCURABLE COMPOSITION FOR NAILS OR ARTIFICIAL NAILS | 株式会社スリーボンド | 2024-05-10 | — | — | WO | disclosed |
| WO-2024095925-A1 | PHOTOCURABLE COMPOSITION FOR NAILS OR ARTIFICIAL NAILS | 株式会社スリーボンド | 2024-05-10 | — | — | WO | disclosed |
| WO-2023085159-A1 | PHOTOCURABLE COMPOSITION FOR NAILS OR ARTIFICIAL NAILS | 株式会社スリーボンド | 2023-05-19 | — | — | WO | disclosed |
| WO-2023085157-A1 | PHOTOCURABLE COMPOSITION | 株式会社スリーボンド | 2023-05-19 | — | — | WO | disclosed |
| WO-2022136110-A1 | COSMETIC COMPOSITION COMPRISING POLYMER PARTICLES BASED ON ACETOACETATE FUNCTIONS | L'OREAL (FR) | 2022-06-30 | — | — | WO | disclosed |
| EP-2418235-B1 | PHOTOCURABLE RESIN COMPOSITION FOR ULTRAVIOLET LED IRRADIATION | Henkel IP & Holding GmbH (DE) | 2019-03-13 | — | — | EP | disclosed |
| WO-2017036504-A1 | WRINKLE-REDUCING COSMETIC METHOD | L'OREAL (FR) | 2017-03-09 | — | — | WO | disclosed |
| WO-2016050788-A1 | COSMETIC PROCESS FOR ATTENUATING WRINKLES | L'OREAL (FR) | 2016-04-07 | — | — | WO | disclosed |
| US-8288451-B2 | Photo-curable resin composition for ultraviolet light-LED irradiation | HENKEL CORPORATION (US) | 2012-10-16 | — | — | US | disclosed |
| EP-2418235-A1 | PHOTOCURABLE RESIN COMPOSITION FOR ULTRAVIOLET LED IRRADIATION | Henkel Corporation (US) | 2012-02-15 | — | — | EP | disclosed |
| US-8044235-B2 | (Meth) acryloyl group-containing aromatic isocyanate compound and production process thereof | SHOWA DENKO K.K. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-20110230585-A1 | PHOTO-CURABLE RESIN COMPOSITION FOR ULTRAVIOLET LIGHT-LED IRRADIATION | HENKEL CORPORATION (US) | 2011-09-22 | — | — | US | disclosed |
| US-20090054543-A1 | (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof | SHOWA DENKO K.K. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-7338984-B2 | Resin composition containing ultrafine inorganic particle | MITSUI CHEMICALS, INC. (JP) | 2008-03-04 | — | — | US | disclosed |
| EP-1544220-B1 | RESIN COMPOSITION CONTAINING ULTRAFINE INORGANIC PARTICLE | MITSUI CHEMICALS INC (JP) | 2007-01-10 | — | — | EP | disclosed |
| US-20050261406-A1 | Resin composition containing ultrafine inorganic particle | MITSUI CHEMICALS, INC. (JP) | 2005-11-24 | — | — | US | disclosed |
| EP-1544220-A1 | RESIN COMPOSITION CONTAINING ULTRAFINE INORGANIC PARTICLE | Mitsui Chemicals, Inc. (JP) | 2005-06-22 | — | — | EP | disclosed |