SCHEMBL5822786

SCHEMBL5822786

CC(C)(CCC1CCC2OC2C1)OC(C)(C)CCC1CCC2OC2C1

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 1/20 0.33
PTGS2 P35354 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL612718 0.86 PTGS1 (0.32) PTGS1PTGS2
SCHEMBL13640011 0.83 PTGS1 (0.32) PTGS1PTGS2
SCHEMBL5818135 0.81
SCHEMBL25808244 0.81 PTGS1 (0.32) PTGS1PTGS2
SCHEMBL28311431 0.79 PTGS1 (0.35) PTGS1PTGS2
SCHEMBL18721788 0.79 PTGS1 (0.30) PTGS1PTGS2
SCHEMBL13865429 0.79 PTGS1 (0.30) PTGS1PTGS2
SCHEMBL18815426 0.78 PTGS1 (0.31) PTGS1PTGS2
SCHEMBL28362780 0.78 PTGS1 (0.31) PTGS1PTGS2
SCHEMBL16750318 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1632794-A2 Radiation sensitive resin composition for forming microlens JSR Corporation (JP) 2006-03-08 EP disclosed
US-20060008735-A1 Radiation sensitive resin composition for forming microlens JSR CORPORATION (JP) 2006-01-12 US disclosed