SCHEMBL5830002

SCHEMBL5830002

COC(C)COC(C)COC(C)COC(C)COC(C)COC(C)COC(C)COC(C)CO.OCCOCCOCCOCCOCCOCCOCCOCCO

nearest known ligand 0.41

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
TSHR P16473 2/20 0.37
MAPK1 P28482 1/20 0.37
TDP1 Q9NUW8 1/20 0.35
THRB P10828 1/20 0.34
HTT P42858 1/20 0.34
MAPT P10636 1/20 0.34
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetraethylene Glycol SCHEMBL5830345 1.00 MEN1 (0.41) MEN1KMT2ATSHRMAPK1TDP1
SCHEMBL5830086 1.00 MEN1 (0.41) MEN1KMT2ATSHRMAPK1TDP1
Hexaethylene Glycol SCHEMBL5830424 1.00 MEN1 (0.41) MEN1KMT2ATSHRMAPK1TDP1
Pentaethylene Glycol SCHEMBL5830674 1.00 MEN1 (0.41) MEN1KMT2ATSHRMAPK1TDP1
SCHEMBL6813943 1.00 MEN1 (0.41) MEN1KMT2ATSHRMAPK1TDP1
SCHEMBL5830514 1.00 MEN1 (0.41) MEN1KMT2ATSHRMAPK1TDP1
Hexaethylene Glycol SCHEMBL5830334 1.00 MEN1 (0.41) MEN1KMT2ATSHRMAPK1TDP1
Hexaethylene Glycol SCHEMBL5830342 1.00 MEN1 (0.41) MEN1KMT2ATSHRMAPK1TDP1
Tetraethylene Glycol SCHEMBL5830347 1.00 MEN1 (0.41) MEN1KMT2ATSHRMAPK1TDP1
SCHEMBL5829976 1.00 MEN1 (0.41) MEN1KMT2ATSHRMAPK1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7067571-B2 Antistatic agent and resin composition and formed product SATO LEGAL REPRESENTATIVE HIRO 2006-06-27 US disclosed
US-7025070-B2 Resin composition for purging contaminant in the plastic processing machine SATO SHIGEKATU 2006-04-11 US disclosed
US-6946026-B2 Release agent for metallic mold SATO HIROAKI 2005-09-20 US disclosed
US-20040132878-A1 Resin composition for purging contaminant in the plastic processing machine SATO SHIGEKATU (JP) 2004-07-08 US disclosed
US-20040132879-A1 Antistatic agent and resin composition and formed product SATO SHIGEKATU (JP) 2004-07-08 US disclosed
US-20040083925-A1 Release agent for metallic mold SATO SHIGEKATU (JP) 2004-05-06 US disclosed