Ethylene Glycol

Ethylene Glycol

SCHEMBL5830645

C=C.C=C.C=C.C=C.C=C.C=C.C=C.CC(O)COC(C)COC(C)CO.OCCO

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.47
MAPK1 P28482 1/20 0.32
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL8851095 1.00 TDP1 (0.47) TDP1MAPK1HSD17B10
Ethylene Glycol SCHEMBL8850702 1.00 TDP1 (0.47) TDP1MAPK1HSD17B10
Ethylene Glycol SCHEMBL5830320 1.00 TDP1 (0.47) TDP1MAPK1HSD17B10
Ethylene Glycol SCHEMBL5831024 1.00 TDP1 (0.47) TDP1MAPK1HSD17B10
Ethylene Glycol SCHEMBL5831090 1.00 TDP1 (0.47) TDP1MAPK1HSD17B10
Ethylene SCHEMBL16178491 0.96 TDP1 (0.50) TDP1MAPK1HSD17B10
Ethylene Glycol SCHEMBL11072979 0.96 TDP1 (0.50) TDP1MAPK1HSD17B10
Ethylene Glycol SCHEMBL3064316 0.96 TDP1 (0.50) TDP1MAPK1HSD17B10
SCHEMBL7615057 0.91 TDP1 (0.54) TDP1MAPK1HSD17B10
SCHEMBL15029 0.91 TDP1 (0.54) TDP1MAPK1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7067571-B2 Antistatic agent and resin composition and formed product SATO LEGAL REPRESENTATIVE HIRO 2006-06-27 US disclosed
US-7025070-B2 Resin composition for purging contaminant in the plastic processing machine SATO SHIGEKATU 2006-04-11 US disclosed
US-6946026-B2 Release agent for metallic mold SATO HIROAKI 2005-09-20 US disclosed
US-20040132878-A1 Resin composition for purging contaminant in the plastic processing machine SATO SHIGEKATU (JP) 2004-07-08 US disclosed
US-20040132879-A1 Antistatic agent and resin composition and formed product SATO SHIGEKATU (JP) 2004-07-08 US disclosed
US-20040083925-A1 Release agent for metallic mold SATO SHIGEKATU (JP) 2004-05-06 US disclosed
EP-0661307-B1 Transparent resin and plastic lens HITACHI CHEMICAL CO LTD (JP) 1997-10-15 EP disclosed
US-5663264-A OF A COPOLYMER CONTAINING AN ALKYLENE OXIDE MONOMER, A POLYFUNCTIONAL (METH)ACRYLATE MONOMER AND A VINYL MONOMER HITACHI CHEMICAL COMPANY, LTD. (JP) 1997-09-02 US disclosed
US-5583191-A FORMED OF TRANSPARENT RESIN OBTAINED BY POLYMERIZING MONOMER HAVING ALKYLENE OXIDE GROUP, POLYFUNCTIONAL (METH)ACRYLATE HAVING DIVALENT BRANCED HYDROCARBON GROUP, OPTIONAL ADDITIONAL VINYL MONOMER; HEAT RESISTANCE HITACHI CHEMICAL COMPANY, LTD. (JP) 1996-12-10 US disclosed
EP-0661307-A2 Transparent resin and plastic lens HITACHI CHEMICAL CO., LTD. (JP) 1995-07-05 EP disclosed