SCHEMBL5830647

SCHEMBL5830647

CC(O)COC(C)COC(C)CO.OCCOCCOCCOCCOCCOCCOCCO

nearest known ligand 0.52

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.52
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
TSHR P16473 2/20 0.37
MAPK1 P28482 1/20 0.37
HSD17B10 Q99714 1/20 0.36
THRB P10828 1/20 0.34
HTT P42858 1/20 0.34
MAPT P10636 1/20 0.34
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5830591 1.00 TDP1 (0.52) TDP1MEN1KMT2ATSHRMAPK1
SCHEMBL5831092 1.00 TDP1 (0.52) TDP1MEN1KMT2ATSHRMAPK1
Pentaethylene Glycol SCHEMBL5830323 1.00 TDP1 (0.52) TDP1MEN1KMT2ATSHRMAPK1
Triethylene Glycol SCHEMBL5830759 1.00 TDP1 (0.52) TDP1MEN1KMT2ATSHRMAPK1
Hexaethylene Glycol SCHEMBL5831026 1.00 TDP1 (0.52) TDP1MEN1KMT2ATSHRMAPK1
SCHEMBL5829752 1.00 TDP1 (0.52) TDP1MEN1KMT2ATSHRMAPK1
SCHEMBL5829781 1.00 TDP1 (0.52) TDP1MEN1KMT2ATSHRMAPK1
Tetraethylene Glycol SCHEMBL5829878 1.00 TDP1 (0.52) TDP1MEN1KMT2ATSHRMAPK1
Tetraethylene Glycol SCHEMBL5829315 1.00 TDP1 (0.52) TDP1MEN1KMT2ATSHRMAPK1
Hexaethylene Glycol SCHEMBL5830831 1.00 TDP1 (0.52) TDP1MEN1KMT2ATSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7067571-B2 Antistatic agent and resin composition and formed product SATO LEGAL REPRESENTATIVE HIRO 2006-06-27 US disclosed
US-7025070-B2 Resin composition for purging contaminant in the plastic processing machine SATO SHIGEKATU 2006-04-11 US disclosed
US-6946026-B2 Release agent for metallic mold SATO HIROAKI 2005-09-20 US disclosed
US-20040132878-A1 Resin composition for purging contaminant in the plastic processing machine SATO SHIGEKATU (JP) 2004-07-08 US disclosed
US-20040132879-A1 Antistatic agent and resin composition and formed product SATO SHIGEKATU (JP) 2004-07-08 US disclosed
US-20040083925-A1 Release agent for metallic mold SATO SHIGEKATU (JP) 2004-05-06 US disclosed
EP-0661307-B1 Transparent resin and plastic lens HITACHI CHEMICAL CO LTD (JP) 1997-10-15 EP disclosed
US-5663264-A OF A COPOLYMER CONTAINING AN ALKYLENE OXIDE MONOMER, A POLYFUNCTIONAL (METH)ACRYLATE MONOMER AND A VINYL MONOMER HITACHI CHEMICAL COMPANY, LTD. (JP) 1997-09-02 US disclosed
US-5583191-A FORMED OF TRANSPARENT RESIN OBTAINED BY POLYMERIZING MONOMER HAVING ALKYLENE OXIDE GROUP, POLYFUNCTIONAL (METH)ACRYLATE HAVING DIVALENT BRANCED HYDROCARBON GROUP, OPTIONAL ADDITIONAL VINYL MONOMER; HEAT RESISTANCE HITACHI CHEMICAL COMPANY, LTD. (JP) 1996-12-10 US disclosed
EP-0661307-A2 Transparent resin and plastic lens HITACHI CHEMICAL CO., LTD. (JP) 1995-07-05 EP disclosed