Ethylene Glycol

Ethylene Glycol

SCHEMBL5830976

C=C.C=C.C=C.C=C.C=C.C=C.C=C.C=C.C=CC.C=CC.C=CC.C=CC.C=CC.C=CC.OCCO.OCCO

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL8851065 1.00 TSHR (0.42) TSHR
Ethylene Glycol SCHEMBL5829750 1.00 TSHR (0.42) TSHR
Ethylene Glycol SCHEMBL5830945 1.00 TSHR (0.42) TSHR
Ethylene Glycol SCHEMBL9475179 1.00 TSHR (0.42) TSHR
Ethylene Glycol SCHEMBL5830979 1.00 TSHR (0.42) TSHR
Ethylene Glycol SCHEMBL5829979 1.00 TSHR (0.42) TSHR
Ethylene Glycol SCHEMBL5830589 1.00 TSHR (0.42) TSHR
Ethylene Glycol SCHEMBL5830357 1.00 TSHR (0.42) TSHR
Ethylene Glycol SCHEMBL20494940 1.00 TSHR (0.42) TSHR
Ethylene Glycol SCHEMBL5829622 1.00 TSHR (0.42) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7067571-B2 Antistatic agent and resin composition and formed product SATO LEGAL REPRESENTATIVE HIRO 2006-06-27 US disclosed
US-7025070-B2 Resin composition for purging contaminant in the plastic processing machine SATO SHIGEKATU 2006-04-11 US disclosed
US-6946026-B2 Release agent for metallic mold SATO HIROAKI 2005-09-20 US disclosed
US-20040132878-A1 Resin composition for purging contaminant in the plastic processing machine SATO SHIGEKATU (JP) 2004-07-08 US disclosed
US-20040132879-A1 Antistatic agent and resin composition and formed product SATO SHIGEKATU (JP) 2004-07-08 US disclosed
US-20040083925-A1 Release agent for metallic mold SATO SHIGEKATU (JP) 2004-05-06 US disclosed