Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.53 |
| ▸ | TSHR | P16473 | 2/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.53 |
| ▸ | GAA | P10253 | 2/20 | 0.45 |
| ▸ | SNCA | P37840 | 1/20 | 0.41 |
| ▸ | RHOA | P61586 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | APP | P05067 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL771170 | 1.00 | CYP3A4 (0.61) | CYP3A4ALDH1A1TSHRHSD17B10GAA | |
| SCHEMBL982544 | 1.00 | CYP3A4 (0.61) | CYP3A4ALDH1A1TSHRHSD17B10GAA | |
| SCHEMBL27459185 | 1.00 | CYP3A4 (0.61) | CYP3A4ALDH1A1TSHRHSD17B10GAA | |
| SCHEMBL209680 | 0.92 | CYP3A4 (0.70) | CYP3A4ALDH1A1TSHRHSD17B10GAA | |
| SCHEMBL28954543 | 0.92 | CYP3A4 (0.53) | CYP3A4ALDH1A1TSHRHSD17B10GAA | |
| SCHEMBL9131544 | 0.88 | TSHR (0.54) | CYP3A4ALDH1A1TSHRHSD17B10GAA | |
| SCHEMBL10965072 | 0.87 | CYP3A4 (0.57) | CYP3A4ALDH1A1TSHRHSD17B10GAA | |
| SCHEMBL21834970 | 0.87 | CYP3A4 (0.65) | CYP3A4ALDH1A1TSHRHSD17B10GAA | |
| SCHEMBL1908038 | 0.83 | CYP3A4 (0.60) | CYP3A4ALDH1A1TSHRHSD17B10GAA | |
| SCHEMBL625194 | 0.83 | CYP3A4 (0.56) | CYP3A4ALDH1A1TSHRHSD17B10GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4151226-A | POLYALLYL CROSSLINKER, ALKYL ACRYLATE, VINYL AROMATIC MONOMER, GRAFT POLYMER | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1979-04-24 | — | — | US | claimed |
| US-7081503-B2 | Process producing vinyl polymer having alkenyl group at end, vinyl polymer, and curable composition | KANEKA CORPORATION (JP) | 2006-07-25 | — | — | US | disclosed |
| US-7009004-B2 | Process for producing vinyl polymer having alkenyl group at end vinyl polymer and curable composition | KANEKA CORPORATION (JP) | 2006-03-07 | — | — | US | disclosed |
| US-6991874-B1 | Compositions suitable for electrochemical cells | BASF AKTIENGESELLSCHAFT (DE) | 2006-01-31 | — | — | US | disclosed |
| US-20060004171-A1 | Process for producing vinyl polymer having alkenyl group at end, vinyl polymer, and curable composition | TSUJI RYOTARO | 2006-01-05 | — | — | US | disclosed |
| US-20040097678-A1 | Process for producing vinyl polymer having alkenyl group at end vinyl polymer and curable composition | KANEKA CORPORATION (JP) | 2004-05-20 | — | — | US | disclosed |
| EP-1375531-A1 | PROCESS FOR PRODUCING VINYL POLYMER HAVING ALKENYL GROUP AT END, VINYL POLYMER, AND CURABLE COMPOSITION | KANEKA CORPORATION (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-6632561-B1 | Particles and dual binder composed of crosslinkable and nonreactive polymers; high temperature dimensional stability; increased lithium ion conductivity | BASF AKTIENGESELLSCHAFT (DE) | 2003-10-14 | — | — | US | disclosed |
| US-6541535-B1 | Binder oligomer or polymer comprises terminally and/or laterally, at least one vinyl ether group a) and at least one group b) which is coreactive with the vinyl ether groups | BASF COATINGS AG (DE) | 2003-04-01 | — | — | US | disclosed |
| US-6475663-B1 | Compositions suitable for electrochemical cells | BASF AKTIENGESELLSCHAFT (DE) | 2002-11-05 | — | — | US | disclosed |
| US-6455111-B1 | USING UNSATURATED POLYESTER RESIN FORMULATION AS IMPREGNATING, CASTING AND COATING MATERIAL | SCHENECTADY INTERNATIONAL, INC. | 2002-09-24 | — | — | US | disclosed |
| US-20020082314-A1 | IMPREGNATING, CASTING AND COATING COMPOUNDS FOR ELECTROTECHNICAL AND/OR ELECTRONIC COMPONENTS AND FOR CARRIER MATERIALS FOR PLANE INSULATING MATERIALS | ALTANA ELECTRICAL INSULATION, GMBH (DE) | 2002-06-27 | — | — | US | disclosed |
| US-4528328-A | Blends of vinyl halide-polyolefin graft polymers and ASA polymers | OCCIDENTAL CHEMICAL CORPORATION (US) | 1985-07-09 | — | — | US | disclosed |
| US-4151226-A | POLYALLYL CROSSLINKER, ALKYL ACRYLATE, VINYL AROMATIC MONOMER, GRAFT POLYMER | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1979-04-24 | — | — | US | disclosed |
| US-3957512-A | POLYAMIDES, POLYUREAS, POLYURETHANES | SIEMENS AKTIENGESELLSCHAFT (DT) | 1976-05-18 | — | — | US | disclosed |