SCHEMBL5833736

SCHEMBL5833736

O=C(O)c1ccc(C(=O)O)c2cc(C34CC5CC(CC(C5)C3)C4)ccc12

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.50
MEN1 O00255 3/20 0.50
POLB P06746 1/20 0.50
GAA P10253 1/20 0.50
GFER P55789 1/20 0.50
SERPINE1 P05121 2/20 0.47
NPC1 O15118 1/20 0.44
HIF1A Q16665 4/20 0.43
EPAS1 Q99814 3/20 0.43
ALDH1A1 P00352 1/20 0.42
LMNA P02545 1/20 0.42
RAB9A P51151 1/20 0.41
EPHX2 P34913 3/20 0.40
STS P08842 2/20 0.40
GPR55 Q9Y2T6 1/20 0.39
THRB P10828 1/20 0.39
RECQL P46063 1/20 0.39
NR2E1 Q9Y466 1/20 0.39
KDM4E B2RXH2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28289972 0.85 KMT2A (0.54) KMT2AMEN1POLBGAAGFER
SCHEMBL7591104 0.82 PTPN1 (0.51) KMT2AMEN1POLBGAAGFER
SCHEMBL13856790 0.79 MEN1 (0.65) KMT2AMEN1POLBGAAGFER
SCHEMBL2710090 0.76 MEN1 (0.44) KMT2AMEN1POLBGAAGFER
SCHEMBL1082729 0.75 KMT2A (0.61) KMT2AMEN1POLBGAAGFER
SCHEMBL3715625 0.75 KMT2A (0.61) KMT2AMEN1POLBGAAGFER
SCHEMBL2708378 0.75 SERPINE1 (0.45) KMT2AMEN1POLBGAAGFER
SCHEMBL8149907 0.74 KDM4E (0.45) SERPINE1NPC1HIF1AEPAS1LMNA
SCHEMBL2708590 0.74 SERPINE1 (0.46) KMT2AMEN1POLBGAAGFER
SCHEMBL28775611 0.74 KMT2A (0.42) KMT2AMEN1POLBGAAGFER

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060210812-A1 Insulating film and method of forming the same JSR CORPORATION (JP) 2006-09-21 US disclosed
EP-1696478-A1 INSULATING FILM, METHOD FOR FORMING SAME AND COMPOSITION FOR FORMING FILM JSR Corporation (JP) 2006-08-30 EP disclosed