SCHEMBL58418

SCHEMBL58418

C1=CCSC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3663924 1.00
SCHEMBL8894238 1.00
SCHEMBL30828724 1.00
SCHEMBL31337850 0.97
SCHEMBL30952084 0.97
SCHEMBL3768736 0.97
Helium SCHEMBL29725034 0.97
SCHEMBL3768743 0.97
SCHEMBL31354735 0.97
SCHEMBL29395030 0.97

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 8731 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12596302-B2 Crosstalk reduction of microcapsule imaging system POLAROID IP B. V. (NL) 2026-04-07 US claimed
EP-4127157-B1 MODIFIED DIPEPTIDE CLEAVASES, USES THEREOF AND RELATED KITS ENCODIA INC (US) 2026-02-11 EP claimed
EP-4266445-B1 SULFUR-BASED BORON TRIFLUORIDE SALT ELECTROLYTE CONTAINING UNSATURATED HETEROCYCLE, PREPARATION METHOD THEREFOR AND USE THEREOF BEIJING WELION NEW ENERGY TECH CO LTD (CN) 2026-01-07 EP claimed
EP-3971194-B1 FLUORINE-CONTAINING COMPOUND AND ANTI-CANCER MEDICAL USE THEREOF ASCENTAWITS PHARMACEUTICALS LTD (CN) 2025-12-03 EP claimed
US-20250347994-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-11-13 US claimed
EP-4626593-A1 CROSSTALK REDUCTION OF MICROCAPSULE IMAGING SYSTEM Polaroid IP B.V. (NL) 2025-10-08 EP claimed
US-20250291247-A1 AMINE COMPOUND, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE RESIST COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-09-18 US claimed
US-12415942-B2 Light or heat triggered frontally cured cure-on-demand adhesives kit NANO AND ADVANCED MATERIALS INSTITUTE LIMITED (HK) 2025-09-16 US claimed
US-12402524-B2 Dendrimers containing luminescent platinum(II) compounds for organic light-emitting devices and their preparation THE UNIVERSITY OF HONG KONG (CN) 2025-08-26 US claimed
US-20250171648-A1 Thermostable Photopolymers in the Visible Spectral Range and Photopolymer Compositions Containing Same COVESTRO DEUTSCHLAND AG (DE) 2025-05-29 US claimed
US-4368329-A COUPLING THIAPYRYLIUM SALT WITH AN AMINE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1983-01-11 US claimed
US-4350751-A THIAPYRYLIUM DYE AND BLEND OF AGGREGATING AND NON-AGGREGATING DIELECTRIC POLYMERS EASTMAN KODAK COMPANY (US) 1982-09-21 US claimed
US-4327169-A HETEROGENEITY; ELECTROGRAPHY; XEROGRAPHY EASTMAN KODAK COMPANY (US) 1982-04-27 US claimed
US-4322487-A Composite electrically photosensitive particles for electrophoretic migration imaging process EASTMAN KODAK COMPANY (US) 1982-03-30 US claimed
US-4315983-A 2,6-Di-tert-butyl-4-substituted thiopyrylium salt, process for production of same, and a photoconductive composition containing same FUJI PHOTO FILM CO., LTD. (JP) 1982-02-16 US claimed
EP-0037635-A1 Thiopyrylium sensitizing dyes MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1981-10-14 EP claimed
US-4283475-A Pentamethine thiopyrylium salts, process for production thereof, and photoconductive compositions containing said salts FUJI PHOTO FILM CO., LTD. (JP) 1981-08-11 US claimed
US-4167412-A COMPRISING A PYRYLIUM OR THIOPYRYLIUM SALT EASTMAN KODAK COMPANY (US) 1979-09-11 US claimed
US-4139655-A Photocurable epoxy compositions containing thiopyrylium salts W. R. GRACE & CO. (US) 1979-02-13 US claimed
US-4054578-A CORROSION INHIBITORS THE DOW CHEMICAL COMPANY (US) 1977-10-18 US claimed