⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28219307 | 1.00 | — | — | |
| SCHEMBL28219666 | 0.87 | — | — | |
| SCHEMBL27933797 | 0.87 | — | — | |
| SCHEMBL192746 | 0.82 | — | — | |
| SCHEMBL33934 | 0.82 | — | — | |
| SCHEMBL29404379 | 0.82 | — | — | |
| SCHEMBL28800342 | 0.82 | — | — | |
| SCHEMBL9466455 | 0.82 | — | — | |
| SCHEMBL183400 | 0.82 | — | — | |
| SCHEMBL8687994 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7922978-B2 | Plasma generating electrode and plasma reactor | NGK INSULATORS, LTD. (JP) | 2011-04-12 | — | — | US | claimed |
| EP-1675156-B1 | Plasma generating electrode and plasma reactor | NGK INSULATORS LTD (JP) | 2010-11-03 | — | — | EP | claimed |
| US-20060138957-A1 | Plasma generating electrode and plasma reactor | NGK INSULATORS, LTD. (JP) | 2006-06-29 | — | — | US | claimed |
| EP-1675156-A1 | Plasma generating electrode and plasma reactor | NGK INSULATORS, LTD. (JP) | 2006-06-28 | — | — | EP | claimed |
| EP-1643093-B1 | PLASMA GENERATING ELECTRODE AND PLASMA REACTOR | NGK INSULATORS LTD (JP) | 2013-07-31 | — | — | EP | disclosed |
| EP-1638377-B1 | PLASMA GENERATING ELECTRODE, PLASMA GENERATION DEVICE, AND EXHAUST GAS PURIFYING APPARATUS | NGK INSULATORS LTD (JP) | 2013-04-03 | — | — | EP | disclosed |
| US-8367966-B2 | Ceramic plasma reactor and reaction apparatus | NGK INSULATORS, LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| EP-2091305-B1 | Plasma reactor and plasma reaction apparatus | NGK INSULATORS LTD (JP) | 2013-01-23 | — | — | EP | disclosed |
| EP-1838140-B1 | Plasma generation electrode, plasma reactor, and exhaust gas cleaning apparatus | NGK INSULATORS LTD (JP) | 2012-10-31 | — | — | EP | disclosed |
| EP-1701597-B1 | PLASMA GENERATING ELECTRODE, ITS MANUFACTURING METHOD, AND PLASMA REACTOR | NGK INSULATORS LTD (JP) | 2012-08-22 | — | — | EP | disclosed |
| US-8176768-B2 | Particulate matter detection device | NGK INSULATORS, LTD. (JP) | 2012-05-15 | — | — | US | disclosed |
| EP-1645730-B1 | PLASMA GENERATING ELECTRODE AND PLASMA REACTOR | NGK INSULATORS LTD (JP) | 2012-02-15 | — | — | EP | disclosed |
| US-20060150911-A1 | Plasma generating electrode, plasma generator, and exhaust gas cleaner | NGK INSULATORS, LTD. (JP) | 2006-07-13 | — | — | US | disclosed |
| US-20060138957-A1 | Plasma generating electrode and plasma reactor | NGK INSULATORS, LTD. (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1675156-A1 | Plasma generating electrode and plasma reactor | NGK INSULATORS, LTD. (JP) | 2006-06-28 | — | — | EP | disclosed |
| EP-1647681-A1 | PLASMA GENERATING ELECTRODE, PLASMA REACTOR, AND EXHAUST GAS PURIFYING DEVICE | NGK INSULATORS, LTD. (JP) | 2006-04-19 | — | — | EP | disclosed |
| EP-1645730-A1 | PLASMA GENERATING ELECTRODE AND PLASMA REACTOR | NGK INSULATORS, LTD. (JP) | 2006-04-12 | — | — | EP | disclosed |
| EP-1643093-A1 | PLASMA GENERATING ELECTRODE AND PLASMA REACTOR | NGK INSULATORS, LTD. (JP) | 2006-04-05 | — | — | EP | disclosed |
| EP-1638376-A1 | PLASMA GENERATING ELECTRODE, PLASMA GENERATION DEVICE, AND EXHAUST GAS PURIFYING APPARATUS | NGK INSULATORS, LTD. (JP) | 2006-03-22 | — | — | EP | disclosed |
| EP-1638377-A1 | PLASMA GENERATING ELECTRODE, PLASMA GENERATION DEVICE, AND EXHAUST GAS PURIFYING APPARATUS | NGK INSULATORS, LTD. (JP) | 2006-03-22 | — | — | EP | disclosed |