Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 8/20 | 0.54 |
| ▸ | HPGD | P15428 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.48 |
| ▸ | TP53 | P04637 | 3/20 | 0.48 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.45 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | MGAM | O43451 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | SI | P14410 | 1/20 | 0.44 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid Ethyl Ester SCHEMBL15282387 | 0.98 | TSHR (0.52) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL9169204 | 0.96 | TSHR (0.50) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL8025809 | 0.94 | TSHR (0.48) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL8159679 | 0.93 | TSHR (0.60) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL9557413 | 0.93 | TSHR (0.60) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL3180 | 0.93 | — | — | |
| Acrylic Acid Ethyl Ester SCHEMBL8013450 | 0.92 | TSHR (0.47) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL28522854 | 0.92 | TSHR (0.47) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL1284845 | 0.91 | TSHR (0.50) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL23607549 | 0.90 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1613 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119504581-A | Method for efficiently synthesizing marbofloxacin key intermediate | 江苏恒盛药业有限公司 | 2025-02-25 | — | — | CN | claimed |
| WO-2025020254-A1 | PLASTIC WRAP AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF | 深圳市星源材质科技股份有限公司 | 2025-01-30 | — | — | WO | claimed |
| CN-119371712-A | Preservative film and preparation method and application thereof | 深圳市星源材质科技股份有限公司 | 2025-01-28 | — | — | CN | claimed |
| CN-119286333-A | Coating composition for coating substrates comprising an adhesive component | 艾仕得涂料系统有限责任公司 | 2025-01-10 | — | — | CN | claimed |
| CN-118804960-A | Cerium oxide based slurry composition for selective and non-selective CMP of silicon oxides, silicon nitrides and polysilicon | CMC材料有限责任公司 | 2024-10-18 | — | — | CN | claimed |
| CN-114729100-B | Blocked polyisocyanate crosslinking agent, process for producing the same and coating composition comprising the same | 巴斯夫涂料有限公司 | 2024-04-16 | — | — | CN | claimed |
| EP-4346624-A1 | SAMPLE COLLECTION SYSTEM | Dermtech, Inc. (US) | 2024-04-10 | — | — | EP | claimed |
| CN-115703757-B | Synthesis method of melaxacin | 浙江中欣氟材股份有限公司 | 2024-04-09 | — | — | CN | claimed |
| CN-117777350-A | Heat-resistant acrylic resin, acrylic pressure-sensitive adhesive for polarizer protective film and preparation method of acrylic pressure-sensitive adhesive | 北京高盟新材料股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-113817110-B | Acrylic polymer, pressure-sensitive adhesive composition, pressure-sensitive adhesive, protective film and display device | 中国乐凯集团有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-1215087-C | Controllable/active free radical polymerization method, polymer, controlling agent and preparing process thereof | UNIV SUZHOU (CN) | 2005-08-17 | — | — | CN | claimed |
| CN-1652025-A | Method for reducing pattern dimension in photoresist layer | TOKYO OHKA KOGYO CO LTD (JP) | 2005-08-10 | — | — | CN | claimed |
| CN-1451668-A | Controllable/active free radical polymerization method, polymer, controlling agent and preparing process thereof | UNIV SUZHOU (CN) | 2003-10-29 | — | — | CN | claimed |
| CN-1430093-A | Electrophoresis disperser containing fluorated solvent and charge control agent | HIBEEKS PHANTOM CORP (US) | 2003-07-16 | — | — | CN | claimed |
| CN-1396627-A | Method for reducing pattern size in photoresist layer | TOKYO APPLIC CHEMICAL IND CO L (JP) | 2003-02-12 | — | — | CN | claimed |
| EP-0711816-A2 | Anti-static laminated film | ALTECH COMPANY LIMITED (JP) | 1996-05-15 | — | — | EP | claimed |
| US-5496677-A | PROTECTIVE COATING, REDUCED SCRATCHING ON STACKING AND HANDLING | FUJI PHOTO FILM CO., LTD. (JP) | 1996-03-05 | — | — | US | claimed |
| EP-0397375-B1 | Photosensitive composition and photosensitive lithographic printing plate | KONISHIROKU PHOTO IND (JP) | 1994-04-06 | — | — | EP | claimed |
| EP-0397375-A1 | Photosensitive composition and photosensitive lithographic printing plate | KONICA CORPORATION (JP) | 1990-11-14 | — | — | EP | claimed |
| US-3957710-A | Paper coating compositions from polymers of olefinically unsaturated monomers | BASF AKTIENGESELLSCHAFT (DT) | 1976-05-18 | — | — | US | claimed |