SCHEMBL5857269

SCHEMBL5857269

CCOc1ccc(S(CC)(CC)OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 5/20 0.44
▸ CA2 P00918 5/20 0.44
▸ CA12 O43570 1/20 0.44
▸ CA7 P43166 1/20 0.44
▸ CA9 Q16790 1/20 0.44
▸ ALDH1A1 P00352 2/20 0.41
▸ SMN1; SMN2 Q16637 1/20 0.41
▸ GAA P10253 3/20 0.41
▸ NPSR1 Q6W5P4 1/20 0.41
▸ LMNA P02545 2/20 0.39
▸ MAPK1 P28482 2/20 0.37
▸ KMT2A Q03164 2/20 0.37
▸ MEN1 O00255 1/20 0.37
▸ MAPT P10636 1/20 0.37
▸ NQO1 P15559 1/20 0.37
▸ TDP1 Q9NUW8 1/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ SQSTM1 Q13501 1/20 0.36
▸ KEAP1 Q14145 1/20 0.36
▸ NFE2L2 Q16236 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5857298 0.99 CA1 (0.45) CA1CA2CA12CA7CA9
SCHEMBL5857798 0.90 CA1 (0.47) CA1CA2CA12CA7CA9
SCHEMBL5857812 0.88 CA1 (0.48) CA1CA2CA12CA7CA9
SCHEMBL5858657 0.88 CA1 (0.44) CA1CA2ALDH1A1GAAKMT2A
SCHEMBL5856273 0.87 CA1 (0.44) CA1CA2CA12CA7CA9
SCHEMBL5855875 0.86 CA1 (0.46) CA1CA2CA12CA7CA9
SCHEMBL5856442 0.86 CA1 (0.43) CA1CA2ALDH1A1GAAKMT2A
SCHEMBL5858672 0.85 CA1 (0.45) CA1CA2CA12CA7CA9
SCHEMBL5856390 0.85 CA1 (0.46) CA1CA2ALDH1A1GAA
SCHEMBL5857351 0.84 MEN1 (0.46) CA1CA2CA12CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7078148-B2 Photoresist with improved sensitivity and resolution to deep ultraviolet rays/excimer lasers; semiconductors; integrated circuits JSR CORPORATION (JP) 2006-07-18 — — US disclosed
US-20040072094-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2004-04-15 — — US disclosed
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