⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4016752 | 0.76 | — | — | |
| SCHEMBL4021372 | 0.76 | — | — | |
| SCHEMBL5858225 | 0.76 | — | — | |
| SCHEMBL4018600 | 0.73 | — | — | |
| SCHEMBL5857965 | 0.73 | — | — | |
| SCHEMBL4020421 | 0.72 | — | — | |
| Hydrochloric Acid SCHEMBL7788508 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL7788501 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL7788506 | 0.69 | — | — | |
| Butadiene SCHEMBL4256114 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7045457-B2 | Film forming material, film forming method, and silicide film | TRI CHEMICAL LABORATORES INC. (JP) | 2006-05-16 | — | — | US | claimed |
| US-20050059243-A1 | Film forming material, film forming method, and silicide film | TRI CHEMICAL LABORATORIES INC. (JP) | 2005-03-17 | — | — | US | claimed |
| US-12509768-B2 | Method of manufacturing semiconductor device, substrate processing apparatus and evaporation system | Kokusai Electric Corporation (JP) | 2025-12-30 | — | — | US | disclosed |
| US-20220042170-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND EVAPORATION SYSTEM | Kokusai Electric Corporation (JP) | 2022-02-10 | — | — | US | disclosed |
| US-20130267100-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND EVAPORATION SYSTEM | HITACHI KOKUSAI ELECTRIC INC. (JP) | 2013-10-10 | — | — | US | disclosed |
| US-7045457-B2 | Film forming material, film forming method, and silicide film | TRI CHEMICAL LABORATORES INC. (JP) | 2006-05-16 | — | — | US | disclosed |
| US-20050059243-A1 | Film forming material, film forming method, and silicide film | TRI CHEMICAL LABORATORIES INC. (JP) | 2005-03-17 | — | — | US | disclosed |