SCHEMBL5861645

SCHEMBL5861645

CCCCOc1ccc(C)cc1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c1cc(C)ccc1OCCCC

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.42
MEN1 O00255 4/20 0.40
KMT2A Q03164 4/20 0.40
GAA P10253 2/20 0.40
KDM4E B2RXH2 2/20 0.40
TSHR P16473 4/20 0.40
MAPK1 P28482 2/20 0.38
HSD17B10 Q99714 1/20 0.38
NPC1 O15118 1/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
MAPT P10636 2/20 0.37
TP53 P04637 1/20 0.37
THRB P10828 2/20 0.37
ALDH1A1 P00352 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
WDR5 P61964 2/20 0.37
THRA P10827 1/20 0.37
S1PR3 Q99500 1/20 0.36
PPARA Q07869 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5862511 0.96 POLB (0.44) POLBMEN1KMT2AGAAKDM4E
SCHEMBL5862976 0.95 POLB (0.43) POLBMEN1KMT2AGAAKDM4E
SCHEMBL5861561 0.95 POLB (0.43) POLBMEN1KMT2AGAAKDM4E
SCHEMBL5862344 0.95 POLB (0.43) POLBMEN1KMT2AGAAKDM4E
SCHEMBL5862493 0.95 POLB (0.43) POLBMEN1KMT2AGAAKDM4E
SCHEMBL5862524 0.94 POLB (0.39) POLBMEN1KMT2AGAAKDM4E
SCHEMBL5862324 0.93 POLB (0.39) POLBMEN1KMT2AGAAKDM4E
SCHEMBL5863001 0.91 POLB (0.40) POLBMEN1KMT2AGAAKDM4E
SCHEMBL5862516 0.90 POLB (0.40) POLBMEN1KMT2AGAAKDM4E
SCHEMBL5862503 0.89 POLB (0.41) POLBMEN1KMT2AGAAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7109311-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-09-19 US disclosed
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process POLL, VEGFA, PIM3 POLB 51/4885MEN1 3908/4885KMT2A 660/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.