SCHEMBL5870229

SCHEMBL5870229

C=CC(O)[CH]CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5318104 0.77
SCHEMBL347195 0.71
SCHEMBL11576921 0.71
SCHEMBL5231807 0.71
SCHEMBL29008134 0.68
SCHEMBL11884349 0.67
SCHEMBL1245280 0.67
SCHEMBL28688695 0.67
SCHEMBL27790956 0.65
Bromide SCHEMBL6129607 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240173227-A1 A FRAGRANCE MIXTURE CONTAINING ISOCITRONELLOL SYMRISE AG (DE) 2024-05-30 US disclosed
US-20240099955-A1 SKINCARE COMPOSITIONS AND METHODS OF USE THEREOF HTL BIOTECHNOLOGY INNOVATION INC. 2024-03-28 US disclosed
EP-3938055-A1 AN ANTIMICROBIAL MIXTURE Symrise AG (DE) 2022-01-19 EP disclosed
WO-2020182318-A1 AN ANTIMICROBIAL MIXTURE SYMRISE AG (DE) 2020-09-17 WO disclosed
EP-3398585-B1 EXTERNAL DERMAL COMPOSITION FOR ANTI-AGEING AND METHOD FOR PRODUCING THE SAME HAYASHIBARA CO (JP) 2020-02-26 EP disclosed
US-20190008747-A1 EXTERNAL DERMAL COMPOSITION FOR ANTI-AGEING AND METHOD FOR PRODUCING THE SAME Hayashibara Co., Ltd. (JP) 2019-01-10 US disclosed
EP-3398585-A1 EXTERNAL DERMAL COMPOSITION FOR ANTI-AGEING AND METHOD FOR PRODUCING THE SAME Hayashibara Co., Ltd. (JP) 2018-11-07 EP disclosed
US-10111822-B2 External dermal composition for anti-ageing and method for producing the same Hayashibara Co., Ltd. (JP) 2018-10-30 US disclosed
EP-2939657-B1 SKIN-EXTERIOR ANTI-AGEING COMPOSITION AND PRODUCTION METHOD THEREFOR HAYASHIBARA CO (JP) 2018-08-08 EP disclosed
US-9271908-B2 Aqueous hair and skin cleaning compositions comprising biotensides EVONIK INDUSTRIES AG (DE) 2016-03-01 US disclosed
US-20150342854-A1 EXTERNAL DERMAL COMPOSITION FOR ANTI-AGEING AND METHOD FOR PRODUCING THE SAME Hayashibara Co., Ltd. (JP) 2015-12-03 US disclosed
EP-2939657-A1 SKIN-EXTERIOR ANTI-AGEING COMPOSITION AND PRODUCTION METHOD THEREFOR Hayashibara Co., Ltd. (JP) 2015-11-04 EP disclosed
US-20140349902-A1 AQUEOUS HAIR AND SKIN CLEANING COMPOSITIONS COMPRISING BIOSURFACTANTS EVONIK INDUSTRIES AG (DE) 2014-11-27 US disclosed
EP-2797571-A2 AQUEOUS HAIR AND SKIN CLEANING COMPOSITIONS COMPRISING BIOTENSIDES Evonik Industries AG (DE) 2014-11-05 EP disclosed
WO-2013098066-A2 AQUEOUS HAIR AND SKIN CLEANING COMPOSITIONS COMPRISING BIOTENSIDES EVONIK INDUSTRIES AG (DE) 2013-07-04 WO disclosed
US-7066990-B2 Ink jet ink and recording material CIBA SPECIALTY CHEMICALS CORPORATION (US) 2006-06-27 US disclosed
US-20040170779-A1 Ink jet ink and recording material CIBA SPECIALTY CHEMICALS CORP. 2004-09-02 US disclosed