Sebacic Acid

Sebacic Acid

SCHEMBL5874337

CCC[N+](CCC)(CCC)CCC.CCC[N+](CCC)(CCC)CCC.O=C([O-])CCCCCCCCC(=O)[O-]

nearest known ligand 0.71

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Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
FABP3 P05413 7/20 0.59
CA1 P00915 1/20 0.56
CES2 O00748 3/20 0.52
CES1 P23141 3/20 0.52
BBOX1 O75936 2/20 0.52
FFAR3 O14843 1/20 0.50
HDAC3 O15379 1/20 0.50
HDAC1 Q13547 1/20 0.50
HDAC2 Q92769 1/20 0.50
HDAC8 Q9BY41 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrapropylammonium SCHEMBL106267 0.98 FABP3 (0.62) FABP3CA1CES2CES1BBOX1
Stearic Acid SCHEMBL109614 0.98 FABP3 (0.62) FABP3CA1CES2CES1BBOX1
Dodecanoate SCHEMBL19878777 0.98 FABP3 (0.62) FABP3CA1CES2CES1BBOX1
Tetrapropylammonium SCHEMBL106754 0.98 FABP3 (0.62) FABP3CA1CES2CES1BBOX1
Tetrapropylammonium SCHEMBL106722 0.98 FABP3 (0.62) FABP3CA1CES2CES1BBOX1
Tetrapropylammonium SCHEMBL104595 0.98 FABP3 (0.62) FABP3CA1CES2CES1BBOX1
Tetrapropylammonium SCHEMBL105337 0.98 CA1 (0.58) FABP3CA1CES2CES1BBOX1
Tetrapropylammonium SCHEMBL109250 0.95 CA1 (0.62) FABP3CA1CES2CES1BBOX1
Tetrapropylammonium SCHEMBL107053 0.93 CA1 (0.58) FABP3CA1BBOX1FFAR3HDAC3
Pentadecanoic Acid SCHEMBL7553579 0.92 FABP3 (0.56) FABP3CA1CES2CES1BBOX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed