SCHEMBL588101

SCHEMBL588101

[Ru]C1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL14954286 0.97
Hydrochloric Acid SCHEMBL27557719 0.97
Hydrochloric Acid SCHEMBL14958379 0.97
Fluoride SCHEMBL14953920 0.97
Iodide SCHEMBL14953886 0.97
SCHEMBL4160308 0.97
SCHEMBL10608851 0.97
SCHEMBL14954100 0.97
SCHEMBL514906 0.97
Ethylene SCHEMBL28824341 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 258 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119707729-A Asymmetric catalytic hydrogenation method of cyclohexene derivative 安徽凯泰莱铂科技有限公司 2025-03-28 CN claimed
CN-118459912-B Polymer matrix composite thermal interface material and preparation method thereof 上海交通大学 2025-01-24 CN claimed
CN-118459912-A Polymer matrix composite thermal interface material and preparation method thereof 上海交通大学 2024-08-09 CN claimed
CN-114957346-B Antibody coupling agent and preparation method and application thereof 中山大学 2023-08-25 CN claimed
CN-114957346-A Antibody coupling agent and preparation method and application thereof 中山大学 2022-08-30 CN claimed
US-8921445-B2 Curable adhesive compositions MITSUI CHEMICALS, INC. (JP) 2014-12-30 US claimed
CN-101801987-B Methods of forming thin metal-containing films by CVD SIGMA ALDRICH CO 2014-03-26 CN claimed
EP-2417210-B1 CURABLE ADHESIVE COMPOSITIONS PIXELOPTICS INC (US) 2013-03-06 EP claimed
EP-2417210-A1 CURABLE ADHESIVE COMPOSITIONS Pixeloptics Inc. (US) 2012-02-15 EP claimed
CN-101981226-A Deposition of ternary oxide films containing ruthenium and alkaline earth metals AIR LIQUIDE 2011-02-23 CN claimed
US-6821845-B1 Semiconductor device and method for manufacturing the same HITACHI, LTD. (JP) 2004-11-23 US claimed
EP-1392760-B1 PHOTOPOLYMERIZATION OF EPISULFIDES USING METAL COMPLEXES AND ITS USE FOR MAKING OPHTHALMIC LENSES ESSILOR INT (FR) 2004-10-13 EP claimed
EP-1233944-B1 COUPLING CONDENSATION SYNTHESIS OF HETEROCYCLES MORPHOCHEM AG (DE) 2004-03-31 EP claimed
EP-1392760-A1 PHOTOPOLYMERIZATION OF EPISULFIDES USING METAL COMPLEXES AND ITS USE FOR MAKING OPHTHALMIC LENSES ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2004-03-03 EP claimed
US-6592801-B2 Photopolymerization of episulfides using metal complexes and its use for making ophthalmic lenses ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2003-07-15 US claimed
US-20030022956-A1 Photopolymerization of episulfides using metal complexes and its use for making ophthalmic lenses ESSILOR INTERNATIONAL (FR) 2003-01-30 US claimed
WO-2002088220-A1 PHOTOPOLYMERIZATION OF EPISULFIDES USING METAL COMPLEXES AND ITS USE FOR MAKING OPHTHALMIC LENSES ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2002-11-07 WO claimed
CN-1357550-A Organic metal compound for chemical vapor deposition and its prepn and chemical vapor deposition method of noble metal film and noble metal compound film TANAKA PRECIOUS METAL IND (JP) 2002-07-10 CN claimed
US-5712331-A Curable epoxy compositions containing aziridine in supercritical fluid carbon dioxide ROCKWELL INTERNATIONAL CORPORATION (US) 1998-01-27 US claimed
EP-0758662-A2 Curable epoxy compositions containing aziridine ROCKWELL INTERNATIONAL CORPORATION (US) 1997-02-19 EP claimed