⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL503042 | 0.97 | — | — | |
| SCHEMBL10983321 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL27613686 | 0.94 | — | — | |
| SCHEMBL699746 | 0.94 | — | — | |
| Acetic Acid SCHEMBL28687060 | 0.85 | TSHR (0.46) | — | |
| SCHEMBL1263482 | 0.75 | TSHR (0.38) | — | |
| SCHEMBL28233548 | 0.75 | — | — | |
| SCHEMBL5171944 | 0.75 | TSHR (0.38) | — | |
| SCHEMBL28208167 | 0.75 | — | — | |
| SCHEMBL420625 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1388757-B1 | Electrode and wiring forming method and method of manufacturing image forming apparatus | CANON KK (JP) | 2012-06-13 | — | — | EP | disclosed |
| US-7115432-B2 | Base pattern forming material for electrode and wiring material absorption, electrode and wiring forming method, and method of manufacturing image forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2006-10-03 | — | — | US | disclosed |
| CN-1248556-C | Underlying pattern forming material for electrode and wiring material absorption and application thereof | CANON KK (JP) | 2006-03-29 | — | — | CN | disclosed |
| CN-1487781-A | Underlying pattern forming material for electrode and wiring material absorption and application thereof | ������������ʽ���� | 2004-04-07 | — | — | CN | disclosed |
| EP-1388757-A1 | Base pattern forming material for forming electrodes and wiring , electrode and wiring forming method and method of manufacturing image forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2004-02-11 | — | — | EP | disclosed |
| US-20040020689-A1 | Base pattern forming material for electrode and wiring material absorption, electrode and wiring forming method, and method of manufacturing image forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2004-02-05 | — | — | US | disclosed |
| US-6129602-A | Methods of fabricating an electron emission device comprised of a metal nucleus, a carbon coating, and a low-work-function material and a method of fabricating an image display device utilizing this electron emission device | CANON KABUSHIKI KAISHA (JP) | 2000-10-10 | — | — | US | disclosed |
| US-6008569-A | Electron emission device with electron-emitting fine particles comprised of a metal nucleus, a carbon coating, and a low-work-function utilizing this electron emission device | CANON KABUSHIKI KAISHA (JP) | 1999-12-28 | — | — | US | disclosed |