SCHEMBL5892083

SCHEMBL5892083

CN(C)CCCCCCCCCCCN

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.69
ALDH1A1 P00352 2/20 0.69
CHRM2 P08172 1/20 0.68
TDP1 Q9NUW8 1/20 0.56
DNM1 Q05193 8/20 0.55
CA12 O43570 2/20 0.50
CA1 P00915 2/20 0.50
CA2 P00918 2/20 0.50
CA3 P07451 2/20 0.50
CA4 P22748 2/20 0.50
CA6 P23280 2/20 0.50
CA5A P35218 2/20 0.50
CA7 P43166 2/20 0.50
CA9 Q16790 2/20 0.50
CA14 Q9ULX7 2/20 0.50
CA5B Q9Y2D0 2/20 0.50
LMNA P02545 1/20 0.50
BLM P54132 1/20 0.50
CYP2C9 P11712 1/20 0.48
CYP2C19 P33261 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL527111 1.00 TSHR (0.69) TSHRALDH1A1CHRM2TDP1DNM1
SCHEMBL3622111 1.00 TSHR (0.69) TSHRALDH1A1CHRM2TDP1DNM1
SCHEMBL11862263 1.00 TSHR (0.69) TSHRALDH1A1CHRM2TDP1DNM1
SCHEMBL1408753 1.00 TSHR (0.69) TSHRALDH1A1CHRM2TDP1DNM1
SCHEMBL1408412 1.00 TSHR (0.69) TSHRALDH1A1CHRM2TDP1DNM1
SCHEMBL363743 1.00
SCHEMBL421181 1.00 TSHR (0.69) TSHRALDH1A1CHRM2TDP1DNM1
SCHEMBL1282643 1.00 TSHR (0.69) TSHRALDH1A1CHRM2TDP1DNM1
SCHEMBL258374 1.00 TSHR (0.69) TSHRALDH1A1CHRM2TDP1DNM1
SCHEMBL258726 1.00 TSHR (0.69) TSHRALDH1A1CHRM2TDP1DNM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024232614-A1 RESIN, RESIN COMPOSITION, AND DISPLAY DEVICE USING SAME 덕산네오룩스 주식회사 2024-11-14 WO disclosed
CN-116490573-A Compound, photosensitive resin composition containing the same, photosensitive resin film, color filter, and CMOS image sensor 三星SDI株式会社 2023-07-25 CN disclosed
WO-2023008750-A1 RESIN COMPOSITION AND DISPLAY DEVICE USING SAME 덕산네오룩스 주식회사 2023-02-02 WO disclosed
CN-110603273-B Modified block copolymer, method for producing modified block copolymer, and resin composition 旭化成株式会社 2022-10-14 CN disclosed
EP-2824108-B1 TETRACYCLIC ANTHRAQUINONE DERIVATIVES TIANJIN HEMAY BIO-TECH CO LTD (CN) 2017-04-19 EP disclosed
EP-1262500-B1 Catalyst for production of a polyurethane resin and method for producing a polyurethane resin TOSOH CORP (JP) 2015-12-30 EP disclosed
US-7064172-B2 Catalyst for production of a polyurethane resin and method for producing a polyurethane resin TOSOH CORPORATION (JP) 2006-06-20 US disclosed
US-6723819-B2 TERTIARY NITROGEN CATALYSTS THAT MAY BE AMINES, IMIDAZOLES, AND/OR UREAS TOSOH CORPORATION (JP) 2004-04-20 US disclosed
US-5112922-A Polystyrene anion exchange polymers SMITH KLINE & FRENCH LABORATORIES (GB) 1992-05-12 US disclosed
EP-0403199-A2 Compounds SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1990-12-19 EP disclosed