SCHEMBL5908014

SCHEMBL5908014

C=C(C)C(=O)OC(C)COC(N)=O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.55
ALDH1A1 P00352 2/20 0.40
LMNA P02545 4/20 0.36
CHRM2 P08172 2/20 0.36
CHRM4 P08173 2/20 0.36
CHRM5 P08912 2/20 0.36
CHRM1 P11229 2/20 0.36
CHRM3 P20309 2/20 0.36
CYP2C9 P11712 1/20 0.36
ALOX15 P16050 1/20 0.35
THRB P10828 1/20 0.35
MAPT P10636 1/20 0.35
TDP1 Q9NUW8 1/20 0.34
CHRNB2 P17787 2/20 0.34
CHRNA4 P43681 2/20 0.34
CHRNB4 P30926 1/20 0.34
CHRNA3 P32297 1/20 0.34
CYP1A2 P05177 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
CYP2D6 P10635 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL160208 0.86 TSHR (0.73) TSHRALDH1A1CHRM2CHRM4CHRM1
SCHEMBL16803291 0.86 TSHR (0.67) TSHRALDH1A1CHRM2CHRM4CHRM1
SCHEMBL4453596 0.85 TSHR (0.66) TSHRALDH1A1LMNACHRM2CHRM4
SCHEMBL2612002 0.85 TSHR (0.59) TSHRALDH1A1LMNACHRM2CHRM4
Ethylene SCHEMBL2156738 0.85 TSHR (0.70) TSHRALDH1A1CHRM2CHRM4CHRM1
Water SCHEMBL7715061 0.85 TSHR (0.70) TSHRALDH1A1CHRM2CHRM4CHRM1
SCHEMBL7261409 0.85 TSHR (0.59) TSHRALDH1A1LMNACHRM2CHRM4
SCHEMBL7760377 0.83 TSHR (0.57) TSHRALDH1A1CHRM2CHRM4CHRM1
SCHEMBL2608257 0.83 TSHR (0.57) TSHRALDH1A1CHRM2CHRM4CHRM1
SCHEMBL6823542 0.81 TSHR (0.66) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5412049-A Polymer compositions containing hydroxyl functional (meth)acrylates and hydroxyalkyl carbamate (meth)acrylates and mixtures thereof UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1995-05-02 US claimed
US-9594303-B2 Resist pattern-forming method and photoresist composition JSR CORPORATION (JP) 2017-03-14 US disclosed
US-9594303-B2 Resist pattern-forming method and photoresist composition JSR CORPORATION (JP) 2017-03-14 US disclosed
US-20150010866-A1 RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION JSR CORPORATION (JP) 2015-01-08 US disclosed
US-20150010866-A1 RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION JSR CORPORATION (JP) 2015-01-08 US disclosed
WO-2013141222-A1 RESIST PATTERN FORMING METHOD AND PHOTORESIST COMPOSITION JSR株式会社 (JP) 2013-09-26 WO disclosed
US-20060217485-A1 Pigment dispersant, method of making coating compositions, and coating compositions BASF CORPORATION (US) 2006-09-28 US disclosed
EP-0675141-B2 Copolymer compositions containing hydroxyl functional (meth)acrylates and hydroxyalkyl carbamate (meth)acrylates and mixtures thereof UNION CARBIDE CHEM PLASTIC (US) 2004-09-29 EP disclosed
EP-0675141-B1 Copolymer compositions containing hydroxyl functional (meth)acrylates and hydroxyalkyl carbamate (meth)acrylates and mixtures thereof UNION CARBIDE CHEM PLASTIC (US) 1998-06-03 EP disclosed
EP-0675141-A1 Copolymer compositions containing hydroxyl functional (meth)acrylates and hydroxyalkyl carbamate (meth)acrylates and mixtures thereof UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1995-10-04 EP disclosed
CN-1104651-A A glazing material comprising a high-hard transparent resin MITSUI TOATSU CHEMICALS (JP) 1995-07-05 CN disclosed
CN-1104631-A A process for preparing a polymerizable monomer for a high-hard transparent resin MITSUI TOATSU CHEMICALS (JP) 1995-07-05 CN disclosed
CN-1104650-A A protective cover for display devices comprising a high-hard, transparent resin MITSUI TOATSU CHEMICALS (JP) 1995-07-05 CN disclosed
CN-1028867-C Method for preparing high-hardness transparent resin MITSUI TOATSU CHEMICALS (JP) 1995-06-14 CN disclosed
US-5412049-A Polymer compositions containing hydroxyl functional (meth)acrylates and hydroxyalkyl carbamate (meth)acrylates and mixtures thereof UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1995-05-02 US disclosed
CN-1048392-A Method for preparing high-hardness transparent resin and novel polymerizable monomer MITSUI TOATSU CHEMICALS (JP) 1991-01-09 CN disclosed