SCHEMBL5934985

SCHEMBL5934985

C=CCC(C)[C](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1135743 0.80
SCHEMBL17945955 0.78
SCHEMBL12972243 0.78
SCHEMBL346161 0.78
SCHEMBL14779856 0.77
SCHEMBL2527358 0.74 GRIK1 (0.35)
SCHEMBL14137412 0.74
SCHEMBL24629606 0.74
SCHEMBL21466953 0.74
SCHEMBL13719254 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107603585-A High-efficient, no-freon pressure break cleanup additive and preparation method 中石化石油工程技术服务有限公司 2018-01-19 CN disclosed
EP-2612653-B1 COMPOSITION FOR CLEANING SCALP AND HEAD HAIR OTSUKA PHARMA CO LTD (JP) 2017-10-11 EP disclosed
US-9062137-B2 Block copolymer and antistatic agent comprising same TOHO CHEMICAL INDUSTRY CO., LTD. (JP) 2015-06-23 US disclosed
CN-103025800-B Block copolymer and antistatic agent comprising same TOHO CHEM IND CO LTD 2014-12-10 CN disclosed
US-8742017-B2 Antistatic agent and resin composition containing same TOHO CHEMICAL INDUSTRY CO., LTD. (JP) 2014-06-03 US disclosed
US-20130216491-A1 COMPOSITION FOR CLEANING SCALP AND HEAD HAIR OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2013-08-22 US disclosed
EP-2612653-A1 COMPOSITION FOR CLEANING SCALP AND HEAD HAIR Otsuka Pharmaceutical Co., Ltd. (JP) 2013-07-10 EP disclosed
CN-103179946-A Composition for cleaning scalp and head hair OTSUKA PHARMA CO LTD 2013-06-26 CN disclosed
US-20130123434-A1 BLOCK COPOLYMER AND ANTISTATIC AGENT COMPRISING SAME TOHO CHEMICAL INDUSTRY CO., LTD. (JP) 2013-05-16 US disclosed
CN-103025800-A Block copolymer and antistatic agent comprising same TOHO CHEM IND CO LTD 2013-04-03 CN disclosed
CN-102791821-A Antistatic agent and resin composition containing the same TOHO CHEM IND CO LTD 2012-11-21 CN disclosed
US-20120283386-A1 ANTISTATIC AGENT AND RESIN COMPOSITION CONTAINING SAME TOHO CHEMICAL INDUSTRY CO., LTD. (JP) 2012-11-08 US disclosed
US-20060276339-A1 Methods and compositions for increasing the efficacy of biologically-active ingredients BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM 2006-12-07 US disclosed
CN-1093876-C Liquid cleaning compsns. containing selected mid-chain branched surfactants PROCTER & GAMBLE (US) 2002-11-06 CN disclosed
CN-1228113-A Liquid cleaning compositions and shampoos containing dianionic or alkoxylated dianionic surfactants PROCTER & GAMBLE (US) 1999-09-08 CN disclosed
CN-1222185-A Liquid cleaning compsns. containing selected mid-chain branched surfactants PROCTER & GAMBLE (US) 1999-07-07 CN disclosed
CN-1213294-A Shampoo compositions with improved deposition of antimicrobial agent PROCTER & GAMBLE (US) 1999-04-07 CN disclosed
US-5037892-A Epoxidation Of Olefin Polymers AKZO N.V. (NL) 1991-08-06 US disclosed