⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10274919 | 0.70 | — | — | |
| SCHEMBL92395 | 0.65 | — | — | |
| SCHEMBL6494013 | 0.65 | — | — | |
| SCHEMBL64958 | 0.65 | — | — | |
| SCHEMBL6825241 | 0.65 | — | — | |
| SCHEMBL125536 | 0.65 | — | — | |
| SCHEMBL17035901 | 0.65 | — | — | |
| SCHEMBL7602 | 0.65 | — | — | |
| SCHEMBL1338238 | 0.60 | — | — | |
| Fluoride SCHEMBL23673680 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20050003977-A1 | Composition for cleaning | DAIKIN INDUSTRIES, LTD. (JP) | 2005-01-06 | — | — | US | claimed |
| EP-1447440-A1 | COMPOSITION FOR CLEANING | Daikin Industries, Ltd. (JP) | 2004-08-18 | — | — | EP | claimed |
| US-20060178282-A1 | Process for production of etching or cleaning fluids | DAIKIN INDUSTRIES, LTD. (JP) | 2006-08-10 | — | — | US | disclosed |
| US-20050054549-A1 | Detergent composition | DAIKIN INDUSTRIES, LTD. (JP) | 2005-03-10 | — | — | US | disclosed |
| US-20050003977-A1 | Composition for cleaning | DAIKIN INDUSTRIES, LTD. (JP) | 2005-01-06 | — | — | US | disclosed |
| US-6831048-B2 | Comprises hydrofluoric acid and ammonia; cleaning a metal gate, contact hole, via hole and/or capacitor; removing a polymer derived from photoresist, and cleaning after chemical mechanical polishing; semiconductors; corrosion resistance | DAIKIN INDUSTRIES, LTD. (JP) | 2004-12-14 | — | — | US | disclosed |
| EP-1447440-A1 | COMPOSITION FOR CLEANING | Daikin Industries, Ltd. (JP) | 2004-08-18 | — | — | EP | disclosed |
| US-20030082912-A1 | Detergent composition | DAIKIN INDUSTRIES, LTD. (JP) | 2003-05-01 | — | — | US | disclosed |
| EP-1277830-A1 | DETERGENT COMPOSITION | Daikin Industries, Ltd. (JP) | 2003-01-22 | — | — | EP | disclosed |