Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 8/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.46 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.44 |
| ▸ | AR | P10275 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | NR1H2 | P55055 | 3/20 | 0.38 |
| ▸ | NR1H3 | Q13133 | 3/20 | 0.38 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22825393 | 0.89 | HRH3 (0.40) | ESR1ESR2HRH3ARCYP1A2 | |
| SCHEMBL1976050 | 0.89 | TSHR (0.46) | ESR1ESR2HRH3ARCYP2C9 | |
| SCHEMBL9307408 | 0.89 | ESR1 (0.62) | ESR1ESR2ARCYP1A2CYP2C9 | |
| SCHEMBL6089418 | 0.87 | NR1H2 (0.45) | HRH3CYP1A2CYP2C19NR1H2NR1H3 | |
| SCHEMBL22825399 | 0.87 | HRH3 (0.39) | ESR1ESR2HRH3ARNR1H2 | |
| SCHEMBL6092358 | 0.87 | KCNN4 (0.45) | ESR1ESR2HRH3CYP2C9CYP2C19 | |
| SCHEMBL11143362 | 0.87 | MAPT (0.47) | ESR1ESR2HRH3ARCYP1A2 | |
| SCHEMBL2967134 | 0.87 | HRH3 (0.39) | ESR1ESR2HRH3ARCYP1A2 | |
| SCHEMBL18905252 | 0.87 | HRH3 (0.39) | ESR1ESR2HRH3ARCYP1A2 | |
| SCHEMBL6037776 | 0.87 | HRH3 (0.39) | ESR1ESR2HRH3ARCYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7005216-B2 | Photo mask | RENESAS TECHNOLOGY CORP. (JP) | 2006-02-28 | — | — | US | disclosed |
| US-6790564-B2 | FOR USE IN PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES; EFFICIENCY | RENESAS TECHNOLOGY CORPORATION (JP) | 2004-09-14 | — | — | US | disclosed |
| US-20030129505-A1 | Krypton fluoride laser lithography; photoresist pattern | RENESAS ELECTRONICS CORPORATION (JP) | 2003-07-10 | — | — | US | disclosed |
| US-20020086222-A1 | Photomask and manufacturing method of an electronic device therewith | RENESAS ELECTRONICS CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |