⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8037345 | 1.00 | — | — | |
| SCHEMBL176061 | 1.00 | — | — | |
| SCHEMBL2073435 | 1.00 | — | — | |
| SCHEMBL822 | 1.00 | — | — | |
| Phosphine SCHEMBL20477183 | 1.00 | — | — | |
| SCHEMBL9177548 | 1.00 | — | — | |
| SCHEMBL1459105 | 0.71 | — | — | |
| SCHEMBL9185475 | 0.71 | — | — | |
| Fluoride SCHEMBL9130872 | 0.71 | — | — | |
| SCHEMBL8204904 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110892512-B | Method for predicting thermal donor generating behavior of silicon wafer, method for evaluating silicon wafer, and method for producing silicon wafer | 胜高股份有限公司 | 2023-06-20 | — | — | CN | claimed |
| CN-118341485-A | Nickel-iron-based electrothermal catalyst for fume purification and preparation method and application thereof | 华中科技大学 | 2024-07-16 | — | — | CN | disclosed |
| CN-110892512-B | Method for predicting thermal donor generating behavior of silicon wafer, method for evaluating silicon wafer, and method for producing silicon wafer | 胜高股份有限公司 | 2023-06-20 | — | — | CN | disclosed |
| US-8115029-B2 | Oxidizing a substrate using a catalyst of a complex of cobalt and N-hydroxysuccinimide, N-hydroxyphthalimide, or N-hydroxymaleimide; alkanes, alkenes, cycloalkanes, cycloalkenes, aromatics, aryl aldehydes, aryl carboxylic acids, benzyl alcohols | UNIVERSITY OF KANSAS (US) | 2012-02-14 | — | — | US | disclosed |
| US-5422185-A | Ethylene or alpha olefin and diene copolymer, silicon dioxide coating | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1995-06-06 | — | — | US | disclosed |
| US-4981632-A | IN SITU OXIDATION | LANXIDE TECHNOLOGY COMPANY, LP (US) | 1991-01-01 | — | — | US | disclosed |
| CN-1036286-A | The subatmospheric plasma spray coating of superconductivity ceramics | PERKIN ELMER CORP (US) | 1989-10-11 | — | — | CN | disclosed |
| US-4824625-A | CONTROLLING OXIDATION AND METAL INFILTRATION | LANXIDE TECHNOLOGY COMPANY, LP (US) | 1989-04-25 | — | — | US | disclosed |
| US-4654496-A | Underwater oxy-arc cutting system using a non-thermic cutting rod | DeMarsh, Peter L. (US) | 1987-03-31 | — | — | US | disclosed |
| US-4599098-A | RADIAL VAPOR DEPOSITION | LIGHTWAVE TECHNOLOGIES, INC. (US) | 1986-07-08 | — | — | US | disclosed |
| US-4350651-A | Process for the rapid sintering of ceramic components and a kiln for carrying out said process | THOMSON-CSF (FR) | 1982-09-21 | — | — | US | disclosed |
| US-4341841-A | INORGANIC LAYER, POLYMER LAYER | NHK SPRING CO., LTD. (JP) | 1982-07-27 | — | — | US | disclosed |
| US-4212891-A | CONTROLLING OXYGEN CONCENTRATION WITH ELECTROLYTIC CELL | JAPAN STORAGE BATTERY COMPANY LIMITED (JP) | 1980-07-15 | — | — | US | disclosed |
| US-4168247-A | SUPPORTED SILVER, SODIUM AS PROMOTER | IMPERIAL CHEMICAL INDUSTRIES LIMITED (GB) | 1979-09-18 | — | — | US | disclosed |
| US-3945799-A | THERMAL DECOMPOSITION, CARBON CATALYST | RIKAGAKU KENKYUSHO (JA) | 1976-03-23 | — | — | US | disclosed |