Ethylene Glycol

Ethylene Glycol

SCHEMBL5953583

C(OCC1CO1)C1CO1.C=C.C=C.C=C.C=C.C=C.C=C.C=C.C=C.C=C.C=C.OCCO

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.52
ALDH1A1 P00352 8/20 0.52
MAPK1 P28482 1/20 0.52
SMN1; SMN2 Q16637 2/20 0.45
TDP1 Q9NUW8 3/20 0.42
TP53 P04637 2/20 0.36
CYP3A4 P08684 2/20 0.36
HIF1A Q16665 1/20 0.33
GLA P06280 1/20 0.31
PDK1 Q15118 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL5954224 1.00 TSHR (0.52) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Ethylene Glycol SCHEMBL8916084 1.00 TSHR (0.52) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Ethylene Glycol SCHEMBL5954245 1.00 TSHR (0.52) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Ethylene Glycol SCHEMBL8621973 1.00 TSHR (0.52) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Ethylene Glycol SCHEMBL262676 1.00 TSHR (0.52) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Ethylene Glycol SCHEMBL1005360 1.00 TSHR (0.52) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Ethylene Glycol SCHEMBL3683096 1.00 TSHR (0.52) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Ethylene Glycol SCHEMBL13583287 1.00 TSHR (0.52) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Ethylene Glycol SCHEMBL21932617 1.00 TSHR (0.52) TSHRALDH1A1MAPK1SMN1; SMN2TDP1
Ethylene Glycol SCHEMBL5448533 0.95 TSHR (0.56) TSHRALDH1A1MAPK1SMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112882342-B Laminate body 旭化成株式会社 2024-04-19 CN disclosed
CN-110941140-B Photosensitive resin composition 旭化成株式会社 2023-09-15 CN disclosed
CN-112882342-A Laminated body 旭化成株式会社 2021-06-01 CN disclosed
CN-107077067-B Photosensitive resin composition, photosensitive resin laminate, method for producing resin pattern, cured film, and display device 旭化成株式会社 2021-04-13 CN disclosed
CN-106997148-B Laminated body 旭化成株式会社 2020-12-29 CN disclosed
CN-110941140-A Photosensitive resin composition 旭化成株式会社 2020-03-31 CN disclosed
CN-106918993-B Photosensitive resin composition, photosensitive resin laminate, and method for forming protective pattern 旭化成株式会社 2020-03-10 CN disclosed
US-20060115740-A1 Hologram recording medium KABUSHIKI KAISHA TOSHIBA (JP) 2006-06-01 US disclosed