SCHEMBL5953828

SCHEMBL5953828

C=C(O)C(=O)OCCCCC

nearest known ligand 0.68

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.68
NAAA Q02083 1/20 0.52
HCAR2 Q8TDS4 2/20 0.50
RAD52 P43351 1/20 0.48
NPSR1 Q6W5P4 1/20 0.48
EPHX1 P07099 1/20 0.48
ALDH1A1 P00352 2/20 0.46
HPGD P15428 1/20 0.45
TP53 P04637 1/20 0.44
CYP3A4 P08684 1/20 0.44
MAPK1 P28482 1/20 0.44
ATM Q13315 1/20 0.43
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
CA9 Q16790 1/20 0.43
FAAH O00519 1/20 0.43
LMNA P02545 1/20 0.43
ACHE P22303 3/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28171672 0.98 TSHR (0.71) TSHRNAAAHCAR2RAD52NPSR1
SCHEMBL27590763 0.98 TSHR (0.71) TSHRNAAAHCAR2RAD52NPSR1
SCHEMBL2288064 0.98 TSHR (0.71) TSHRNAAAHCAR2RAD52NPSR1
SCHEMBL27893700 0.98 TSHR (0.71) TSHRNAAAHCAR2RAD52NPSR1
SCHEMBL11761835 0.98 TSHR (0.71) TSHRNAAAHCAR2RAD52NPSR1
SCHEMBL2950940 0.98 TSHR (0.71) TSHRNAAAHCAR2RAD52NPSR1
SCHEMBL8398453 0.98 TSHR (0.71) TSHRNAAAHCAR2RAD52NPSR1
SCHEMBL16538565 0.98 TSHR (0.71) TSHRNAAAHCAR2RAD52NPSR1
SCHEMBL2957226 0.98 TSHR (0.71) TSHRNAAAHCAR2RAD52NPSR1
SCHEMBL198128 0.93 TSHR (0.59) TSHRNAAAHCAR2RAD52NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115551902-B Cross-linked material and use thereof PPG工业俄亥俄公司 2024-02-02 CN claimed
CN-115353810-B UV and moisture dual-curing adhesive as well as preparation method and application thereof 杭州之江有机硅化工有限公司 2024-01-30 CN claimed
EP-3820913-A1 PROCESS FOR END FUNCTIONALIZED ACRYLIC OLIGOMERS VIA HIGH TEMPERATURE POLYMERIZATION AND EFFICIENT ADDITION REACTIONS BASF SE (DE) 2021-05-19 EP claimed
WO-2020011993-A1 PROCESS FOR END FUNCTIONALIZED ACRYLIC OLIGOMERS VIA HIGH TEMPERATURE POLYMERIZATION AND EFFICIENT ADDITION REACTIONS BASF SE (DE) 2020-01-16 WO claimed
CN-103666098-A Aqueous UV gravure varnish HUNAN HULIDA COATINGS TECHNOLOGY CO LTD 2014-03-26 CN claimed
EP-0847050-B1 Optical recording medium MITSUBISHI CHEM CORP (JP) 2004-11-17 EP claimed
US-5972457-A COMPRISING TRANSPARENT SUBSTRATE, RECORDING LAYER, REFLECTIVE LAYER, PROTECTIVE LAYER, AND INK-RECEIVING LAYER CONTAINING HYDROPHILIC AND WATER INSOLUBLE FILLER MITSUBISHI CHEMICAL CORPORATION (JP) 1999-10-26 US claimed
EP-0847050-A2 Optical recording medium Mitsubishi Chemical Corporation (JP) 1998-06-10 EP claimed
CN-115353810-B UV and moisture dual-curing adhesive as well as preparation method and application thereof 杭州之江有机硅化工有限公司 2024-01-30 CN disclosed
WO-2020081750-A1 TWO-PART, CYANOACRYLATE/FREE RADICALLY CURABLE ADHESIVE SYSTEMS Henkel IP & Holding GmbH (DE) 2020-04-23 WO disclosed
US-9081132-B2 Adhesive film for a reflection sheet and reflection sheet using the same TORAY ADVANCED MATERIALS KOREA INC. (KR) 2015-07-14 US disclosed
CN-103666098-A Aqueous UV gravure varnish HUNAN HULIDA COATINGS TECHNOLOGY CO LTD 2014-03-26 CN disclosed
EP-2458452-A1 Hologram laminate and method of manufacturing hologram laminate Sony Corporation (JP) 2012-05-30 EP disclosed
US-20120127546-A1 HOLOGRAM LAMINATE AND METHOD OF MANUFACTURING HOLOGRAM LAMINATE SONY DADC CORPORATION (JP) 2012-05-24 US disclosed
US-5973094-A Functional polymers WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1999-10-26 US disclosed
US-5972457-A COMPRISING TRANSPARENT SUBSTRATE, RECORDING LAYER, REFLECTIVE LAYER, PROTECTIVE LAYER, AND INK-RECEIVING LAYER CONTAINING HYDROPHILIC AND WATER INSOLUBLE FILLER MITSUBISHI CHEMICAL CORPORATION (JP) 1999-10-26 US disclosed
EP-0847050-A2 Optical recording medium Mitsubishi Chemical Corporation (JP) 1998-06-10 EP disclosed
EP-0794199-A2 Novel functional polymers WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 1997-09-10 EP disclosed
CN-1122604-A Plastisol composition TEROSON GMBH (DE) 1996-05-15 CN disclosed
US-4125678-A Radiation polymerizable compositions THE SHERWIN-WILLIAMS COMPANY (US) 1978-11-14 US disclosed