⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1147858 | 0.82 | — | — | |
| SCHEMBL548508 | 0.80 | — | — | |
| SCHEMBL29240257 | 0.78 | — | — | |
| SCHEMBL897423 | 0.75 | — | — | |
| SCHEMBL28057778 | 0.74 | — | — | |
| SCHEMBL28002785 | 0.72 | — | — | |
| SCHEMBL20336447 | 0.72 | — | — | |
| SCHEMBL27449627 | 0.72 | — | — | |
| SCHEMBL28033105 | 0.72 | — | — | |
| SCHEMBL2641198 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9682857-B2 | Methods of improving long range order in self-assembly of block copolymer films with ionic liquids and materials produced therefrom | MICRON TECHNOLOGY, INC. (US) | 2017-06-20 | — | — | US | claimed |
| US-20140127456-A1 | METHODS OF IMPROVING LONG RANGE ORDER IN SELF-ASSEMBLY OF BLOCK COPOLYMER FILMS WITH IONIC LIQUIDS AND MATERIALS PRODUCED THEREFROM | MICRON TECHNOLOGY, INC. (US) | 2014-05-08 | — | — | US | claimed |
| US-8641914-B2 | Methods of improving long range order in self-assembly of block copolymer films with ionic liquids | MICRON TECHNOLOGY, INC. (US) | 2014-02-04 | — | — | US | claimed |
| US-8425982-B2 | Methods of improving long range order in self-assembly of block copolymer films with ionic liquids | MICRON TECHNOLOGY, INC. (US) | 2013-04-23 | — | — | US | claimed |
| US-10600680-B2 | Chemoepitaxy etch trim using a self aligned hard mask for metal line to via | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-03-24 | — | — | US | disclosed |
| US-10256139-B2 | Chemoepitaxy etch trim using a self aligned hard mask for metal line to via | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-04-09 | — | — | US | disclosed |
| US-20190043754-A1 | CHEMOEPITAXY ETCH TRIM USING A SELF ALIGNED HARD MASK FOR METAL LINE TO VIA | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2019-02-07 | — | — | US | disclosed |
| US-10059820-B2 | Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-08-28 | — | — | US | disclosed |
| US-10037398-B2 | Pattern decomposition method for wiring patterns with chemoepitaxy based directed self assembly | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-07-31 | — | — | US | disclosed |
| US-20170344691-A1 | PATTERN DECOMPOSITION METHOD FOR WIRING PATTERNS WITH CHEMOEPITAXY BASED DIRECTED SELF ASSEMBLY | GOVERNMENT OF THE UNITED STATES AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE | 2017-11-30 | — | — | US | disclosed |
| US-20170321025-A1 | HYBRID TOPOGRAPHICAL AND CHEMICAL PRE-PATTERNS FOR DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-11-09 | — | — | US | disclosed |
| US-9738765-B2 | Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2017-08-22 | — | — | US | disclosed |
| EP-2276690-B1 | GRAPHOEPITAXIAL SELF-ASSEMBLY OF ARRAYS OF HALF-CYLINDERS FORMED ON A SUBSTRATE | MICRON TECHNOLOGY INC (US) | 2012-09-19 | — | — | EP | disclosed |
| US-20120223052-A1 | Methods of Improving Long Range Order in Self-Assembly of Block Copolymer Films with Ionic Liquids | MICRON SEMICONDUCTOR PRODUCTS, INC. | 2012-09-06 | — | — | US | disclosed |
| US-20120138570-A1 | Graphoepitaxial Self-Assembly of Arrays of Downward Facing Half-Cylinders | MICRON SEMICONDUCTOR PRODUCTS, INC. | 2012-06-07 | — | — | US | disclosed |
| US-8114301-B2 | Graphoepitaxial self-assembly of arrays of downward facing half-cylinders | MICRON TECHNOLOGY, INC. (US) | 2012-02-14 | — | — | US | disclosed |
| EP-2276690-A2 | GRAPHOEPITAXIAL SELF-ASSEMBLY OF ARRAYS OF HALF-CYLINDERS FORMED ON A SUBSTRATE | Micron Technology, Inc. (US) | 2011-01-26 | — | — | EP | disclosed |
| WO-2009134635-A2 | GRAPHOEPITAXIAL SELF-ASSEMBLY OF ARRAYS OF DOWNWARD FACING HALF-CYLINDERS | MICRON TECHNOLOGY, INC. (US) | 2009-11-05 | — | — | WO | disclosed |
| US-20090274887-A1 | Graphoepitaxial Self-Assembly of Arrays of Downward Facing Half-Cylinders | MICRON SEMICONDUCTOR PRODUCTS, INC. | 2009-11-05 | — | — | US | disclosed |
| US-20090240001-A1 | Methods of Improving Long Range Order in Self-Assembly of Block Copolymer Films with Ionic Liquids | MICRON TECHNOLOGY, INC. | 2009-09-24 | — | — | US | disclosed |