SCHEMBL5965366

SCHEMBL5965366

CC(S)NCCC(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2179403 0.80
SCHEMBL19464500 0.79
Hydrochloric Acid SCHEMBL5595901 0.78 ECE1 (0.42)
SCHEMBL8369782 0.78
SCHEMBL1661524 0.76
SCHEMBL88209 0.76 CYP1A2 (0.44)
SCHEMBL919394 0.76
SCHEMBL3713828 0.76 CYP1A2 (0.44)
SCHEMBL23126914 0.75
SCHEMBL1148952 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060281027-A1 Aspherical-polymer fine particles and production method thereof, and method for producing lithographic printing plate, ink composition and electrophoretic particle composition FUJI PHOTO FILM CO., LTD. 2006-12-14 US disclosed
EP-1728805-A1 Aspherical-polymer fine particles and production method thereof, and method for producing lithographic printing plate, ink composition and electrophoretic particle composition Fuji Photo Film Co., Ltd. (JP) 2006-12-06 EP disclosed