SCHEMBL5981995

SCHEMBL5981995

CCOc1cc(C(=O)c2ccc(N)c(OCC)c2)ccc1N

nearest known ligand 0.75

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.75
NPC1 O15118 1/20 0.75
USP2 O75604 1/20 0.75
RAB9A P51151 1/20 0.75
SMN1; SMN2 Q16637 1/20 0.75
ALDH1A1 P00352 3/20 0.59
MAPK1 P28482 2/20 0.59
L3MBTL1 Q9Y468 2/20 0.59
KDM4E B2RXH2 1/20 0.59
MEN1 O00255 1/20 0.59
POLB P06746 1/20 0.59
MAPT P10636 1/20 0.59
HPGD P15428 1/20 0.59
KMT2A Q03164 1/20 0.59
CREBBP Q92793 1/20 0.58
LMNA P02545 2/20 0.51
HTT P42858 1/20 0.51
TSHR P16473 4/20 0.50
PDE4A P27815 2/20 0.49
PDE4B Q07343 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1560918 0.88 TSHR (0.66) HSD17B10NPC1USP2RAB9ASMN1; SMN2
SCHEMBL18369795 0.88 CREBBP (0.76) HSD17B10NPC1USP2RAB9ASMN1; SMN2
SCHEMBL1937682 0.88 MAPK1 (0.69) HSD17B10NPC1USP2RAB9ASMN1; SMN2
Hydrochloric Acid SCHEMBL4052649 0.86 TSHR (0.64) HSD17B10NPC1USP2RAB9ASMN1; SMN2
SCHEMBL223446 0.85 HSD17B10 (0.55) HSD17B10NPC1USP2RAB9ASMN1; SMN2
SCHEMBL670443 0.85 CYP1A2 (0.57) HSD17B10NPC1USP2RAB9ASMN1; SMN2
SCHEMBL13575618 0.83 PLK1 (0.57) HSD17B10NPC1USP2RAB9ASMN1; SMN2
SCHEMBL20496433 0.83 NPC1 (0.71) HSD17B10NPC1USP2RAB9ASMN1; SMN2
SCHEMBL3109286 0.82 TP53 (0.53) HSD17B10NPC1USP2RAB9ASMN1; SMN2
SCHEMBL14454254 0.80 TP53 (0.58) HSD17B10NPC1USP2RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7139460-B2 Optical element, method of producing optical elements, coating device, and coating method HITACHI CHEMICAL COMPANY, LTD. (JP) 2006-11-21 US disclosed
US-20060251379-A1 Optical element, process for producing optical element, coating equipment, and coating method KURODA TOSHIHIRO 2006-11-09 US disclosed
US-20040234222-A1 Optical element, method of producing optical elements, coating device, and coating method HITACHI CHEMICAL COMPANY, LTD. (JP) 2004-11-25 US disclosed
US-6810181-B2 LAYER OF A FLUORINE-CONTAINING POLYIMIDE AND A LAYER OF A FLUORINE-FREE RESIN IS INTERPOSED BETWEEN THE POLYIMIDE LAYER AND THE ELECTRODE HITACHI CHEMICAL CO., LTD. (JP) 2004-10-26 US disclosed
US-20040096161-A1 Electrode structure HITACHI CHEMICAL CO., LTD. (JP) 2004-05-20 US disclosed
US-20030054184-A1 Optical element, method for the production thereof and optical module HITACHI CHEMICAL CO., LTD. (JP) 2003-03-20 US disclosed
US-6001277-A Liquid-crystal alignment film HITACHI CHEMICAL COMPANY, LTD. (JP) 1999-12-14 US disclosed
US-5571579-A FORMING A POLYIMIDE FILM AND RUBBING THE SURFACE OF THE FILM HITACHI CHEMICAL COMPANY, LTD (JP) 1996-11-05 US disclosed
EP-0450926-B1 Fluorine-containing polyimides and precursors thereof HITACHI CHEMICAL CO LTD (JP) 1996-07-31 EP disclosed
US-5401878-A Fluorinated unsaturated alkyl ether aryldiamines for polyimide polymers with heat resistance and waterproofing HITACHI CHEMICAL COMPANY, LTD. (JP) 1995-03-28 US disclosed
US-5270438-A Fluorine-containing polyimides and precursors thereof HITACHI CHEMICAL COMPANY, LTD. (JP) 1993-12-14 US disclosed
EP-0450926-A2 Fluorine-containing polyimides and precursors thereof Hitachi Chemical Co., Ltd. (JP) 1991-10-09 EP disclosed