⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28850262 | 0.69 | — | — | |
| SCHEMBL15844074 | 0.69 | — | — | |
| SCHEMBL28253431 | 0.69 | — | — | |
| Ammonia Solution, Strong SCHEMBL1550394 | 0.67 | — | — | |
| Ammonia Solution, Strong SCHEMBL3718561 | 0.67 | — | — | |
| SCHEMBL4988969 | 0.67 | — | — | |
| SCHEMBL18989306 | 0.67 | — | — | |
| SCHEMBL27567076 | 0.67 | — | — | |
| SCHEMBL9641343 | 0.67 | — | — | |
| SCHEMBL28025124 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 191 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12338369-B2 | Nitride inhibitors for high selectivity of TiN—SiN CMP applications | CMC MATERIALS LLC (US) | 2025-06-24 | — | — | US | claimed |
| US-20240199917-A1 | NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS | CMC MATERIALS LLC | 2024-06-20 | — | — | US | claimed |
| EP-4056659-B1 | NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TIN-SIN CMP APPLICATIONS | CMC MAT LLC (US) | 2024-04-03 | — | — | EP | claimed |
| EP-3681963-B1 | NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TIN-SIN CMP APPLICATIONS | CMC MAT INC (US) | 2023-05-10 | — | — | EP | claimed |
| US-11492707-B2 | Method for specifically adjusting the electrical conductivity of conversion coatings | CHEMETALL GMBH (DE) | 2022-11-08 | — | — | US | claimed |
| EP-4056659-A1 | NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TIN-SIN CMP APPLICATIONS | CMC Materials, Inc. (US) | 2022-09-14 | — | — | EP | claimed |
| CN-111108161-B | High selectivity nitride inhibitors for TiN-SiN CMP applications | CMC材料股份有限公司 | 2022-06-14 | — | — | CN | claimed |
| EP-3280830-B1 | METHOD FOR SPECIFICALLY ADJUSTING THE ELECTRICAL CONDUCTIVITY OF CONVERSION COATINGS | CHEMETALL GMBH (DE) | 2021-03-31 | — | — | EP | claimed |
| EP-3681963-A2 | NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TIN-SIN CMP APPLICATIONS | Cabot Microelectronics Corporation (US) | 2020-07-22 | — | — | EP | claimed |
| CN-111108161-A | High selectivity nitride inhibitors for TiN-SiN CMP applications | 嘉柏微电子材料股份公司 | 2020-05-05 | — | — | CN | claimed |
| CN-1966594-A | Polishing composition for metal cmp | CABOT MICROELECTRONICS CORP (US) | 2007-05-23 | — | — | CN | claimed |
| EP-0896042-B1 | A polishing composition including an inhibitor of tungsten etching | CABOT MICROELECTRONICS CORP (US) | 2005-02-09 | — | — | EP | claimed |
| CN-1142237-C | Stepped synthesis process of preparing stable inorganics-based solid tunable dye laser medium | 浙江大学 | 2004-03-17 | — | — | CN | claimed |
| CN-1272221-A | Polishing composition comprising inhibitor of tungsten erosion | CABOT CORP (US) | 2000-11-01 | — | — | CN | claimed |
| US-6136711-A | CHEMICAL MECHANICAL POLISHING MIXTURE COMPRISING A STABILIZER TO MINIMIZE ETCHING AND CORROSION | CABOT CORPORATION (US) | 2000-10-24 | — | — | US | claimed |
| EP-0896042-A1 | A polishing composition including an inhibitor of tungsten etching | Cabot Corporation (US) | 1999-02-10 | — | — | EP | claimed |
| WO-1999005706-A1 | A POLISHING COMPOSITION INCLUDING AN INHIBITOR OF TUNGSTEN ETCHING | CABOT CORPORATION (US) | 1999-02-04 | — | — | WO | claimed |
| EP-0281825-B1 | SILICONE POLYIMIDES AND METHOD FOR MAKING | GENERAL ELECTRIC COMPANY (US) | 1992-09-09 | — | — | EP | claimed |
| US-4826916-A | PROTECTIVE COATINGS | GENERAL ELECTRIC COMPANY (US) | 1989-05-02 | — | — | US | claimed |
| EP-0281825-A2 | Silicone polyimides and method for making | GENERAL ELECTRIC COMPANY (US) | 1988-09-14 | — | — | EP | claimed |