⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8836256 | 0.81 | — | — | |
| SCHEMBL10900704 | 0.81 | — | — | |
| SCHEMBL1047680 | 0.79 | — | — | |
| SCHEMBL6055304 | 0.72 | — | — | |
| SCHEMBL8756188 | 0.72 | — | — | |
| SCHEMBL1325042 | 0.72 | — | — | |
| SCHEMBL8155299 | 0.72 | — | — | |
| SCHEMBL890867 | 0.72 | — | — | |
| SCHEMBL8380495 | 0.72 | — | — | |
| SCHEMBL6055299 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8637602-B2 | Stabilization of vinyl ether materials | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-01-28 | — | — | US | claimed |
| US-8168109-B2 | Stabilizers for vinyl ether resist formulations for imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-01 | — | — | US | claimed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | claimed |
| WO-2011020675-A1 | STABILIZERS FOR VINYL ETHER RESIST FORMULATIONS FOR IMPRINT LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-24 | — | — | WO | claimed |
| US-20110042862-A1 | Stabilizers for Vinyl Ether Resist Formulations for Imprint Lithography | INTERNATIONAL BUSINESS CORPORATION (US) | 2011-02-24 | — | — | US | claimed |
| US-20090092767-A1 | STABILIZATION OF VINYL ETHER MATERIALS | GLOBALFOUNDRIES INC. (KY) | 2009-04-09 | — | — | US | claimed |
| US-7488771-B2 | Stabilization of vinyl ether materials | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-02-10 | — | — | US | claimed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | claimed |
| US-20070066750-A1 | Stabilization of vinyl ether materials | GLOBALFOUNDRIES INC. (KY) | 2007-03-22 | — | — | US | claimed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | claimed |
| EP-3141538-B1 | IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS | VERSUM MAT US LLC (US) | 2019-10-30 | — | — | EP | disclosed |
| EP-2318477-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-06-05 | — | — | EP | disclosed |
| EP-3141538-A1 | IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-03-15 | — | — | EP | disclosed |
| EP-2141141-B1 | Improved Process Stability of NBDE Using Substituted Phenol Stabilizers | AIR PROD & CHEM (US) | 2016-09-28 | — | — | EP | disclosed |
| EP-1931613-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-11-11 | — | — | EP | disclosed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | disclosed |
| US-20070066750-A1 | Stabilization of vinyl ether materials | GLOBALFOUNDRIES INC. (KY) | 2007-03-22 | — | — | US | disclosed |
| US-20070057234-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |
| US-20070057235-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | disclosed |